Investigation on the structure of TiO2 films sputtered on alloy substrates

被引：17
作者：
Gu, GR
Li, YA
Tao, YC
He, Z
Li, JJ
Yin, H
Li, WQ
Zhao, YN [1 ]
机构：
[1] Jilin Univ, Natl Key Lab Superhard Mat, Changchun 130023, Jilin, Peoples R China
[2] Yanbian Univ, Coll Sci & Engn, Yanji 133002, Jilin, Peoples R China
[3] Jilin Univ, Key Lab Supermol Struct & Spect, Changchun 130023, Jilin, Peoples R China
来源：
VACUUM | 2003年 / 71卷 / 04期
关键词：
TiO2; films; phase transition; Raman spectra; X-ray diffraction;
D O I：
10.1016/S0042-207X(03)00048-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Titanium dioxide (TiO2) films have been successfully deposited on metal alloy substrates by radio-frequency magnetron reactive sputtering in an Ar + O-2 gas mixture. The effects of gas total pressure on the structure and phase transition of TiO2 films were studied by X-ray diffraction and Raman spectra. It is suggested that the film structure changes from rutile to anatase while work gas total pressure changes from 0.2 to 2 Pa. The structure of TiO2 films is not affected by the film thickness. (C) 2003 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：487 / 490
页数：4
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