Plasma Emission Spectroscopy to Study the Resputtering Produced by Pulsed Laser Deposition of Au and in Combination With Magnetron Sputtering of ZnO

Optical emission spectroscopy (OES) has been used as an in-situ method to monitor the film deposition carried out using a combination of two plasma-assisted techniques; pulsed laser deposition (PLD) and magnetron sputtering (MS). In this work, the plasmas produced during the PLD ablation of a gold target in an argon atmosphere and its simultaneous use with MS of ZnO were characterized by OES. Neutral atoms of Au, Ar, and Zn and ions of Au were identified, and the temporal and spatial evolution of their emission lines was studied along the axis of the PLD plasma expansion. During the PLD of Au an increment in the emission intensity of neutral Au near the substrates, as a function of the laser pulse fluence, demonstrated resputtering of the Au deposit by the high energy species produced by PLD. When the combination of PLD of Au and MS of ZnO was performed, a similar increment was observed in the emission intensity, but in this case of neutral Zn that was caused by the preferential resputtering of Zn from the ZnO-Au deposit. The MS plasma neither significantly affect the PLD plasma expansion nor did it affect the resputtering of the films.