Empirical pseudopotential calculation of band structure and deformation potentials of biaxially strained semiconductors

被引:0
|
作者
Kim, Jiseok [1 ]
Fischetti, Massimo V. [1 ]
机构
[1] Univ Massachusetts, Dept Elect & Comp Engn, Amherst, MA 01003 USA
来源
IWCE-13: 2009 13TH INTERNATIONAL WORKSHOP ON COMPUTATIONAL ELECTRONICS | 2009年
关键词
COMPOUND SEMICONDUCTORS; GE; ALLOYS; ELECTROREFLECTANCE; PARAMETERS; MOBILITY; SI;
D O I
暂无
中图分类号
TP301 [理论、方法];
学科分类号
081202 ;
摘要
The electronic band structure of relaxed and biaxially strained Si, Ge, III-V semiconductors (GaAs, GaSb, InAs, InSb, InP) and their alloys (InxGa1-xAs, InxGa1-xSb) on different interface orientations, (001), (110) and (111), is calculated using the nonlocal empirical pseudopotential method (EPM) with spin-orbit interaction using cubic spline interpolations of the atomic form factors. For III-V alloys, the virtual crystal approximation (VCA) is employed to calculate the band gap bowing parameters. Calculated results such as band gap (direct and indirect), band gap bowing parameters, and deformation potentials are fitted to the experimental data when available. Deformation potentials are determined using linear deformation potential theory when the small biaxial strain (in-plane) is present.
引用
收藏
页码:149 / 152
页数:4
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