Modeling the Charge-Transfer Resistance to Determine the Role of Guar and Activated Polyacrylamide in Copper Electrodeposition

被引:10
作者
Fabian, C. P. [1 ,2 ]
Ridd, M. J. [2 ]
Sheehan, M. E. [1 ]
Mandin, Ph. [3 ]
机构
[1] James Cook Univ, Sch Engn, Townsville, Qld 4811, Australia
[2] James Cook Univ, Sch Pharm & Mol Sci, Townsville, Qld 4811, Australia
[3] ENSCP, LECA UMR CNRS 7575, Lab Electrochim & Chim Analyt, F-75231 Paris 05, France
关键词
ROTATING CYLINDER ELECTRODE; MASS-TRANSPORT PROPERTIES; POLYETHYLENE-GLYCOL; DIFFUSION IMPEDANCE; DAMASCENE PROCESS; DEPOSITION; ADDITIVES; CHLORIDE; BATH; ADSORPTION;
D O I
10.1149/1.3176879
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
In this paper, we explore the effects of two organic additives (guar and a selectively hydrolyzed polyacrylamide) in the presence of chloride ions on copper electrodeposition using cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) at a rotating cylinder electrode (RCE). This paper also demonstrates that the CV and EIS results are consistent and that the selectively hydrolyzed polyacrylamide, "activated polyacrylamide" (APAM), acts as a suppressor/inhibitor at the cathode/electrolyte interface, whereas guar does not. This paper presents an EIS measurement model for the effect of APAM + Cl- on a copper cathode. The EIS model was applied to data obtained at a potential of -470 mV vs a mercurous-mercuric sulfate reference electrode (MSE) at 45 degrees C. A comparison between the effect of APAM + Cl- and guar + Cl- was conducted at -490 mV (vs MSE) at 45 degrees C. APAM + Cl- was also investigated at -445 mV (vs MSE) at 65 degrees C. EIS was used to determine the effect of APAM + Cl- or guar + Cl- aging on the charge-transfer resistance using the RCE. CV was used to determine their effect on the polarization of the electrode. The EIS and CV results are consistent. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3176879] All rights reserved.
引用
收藏
页码:D400 / D407
页数:8
相关论文
共 49 条
[11]  
GABE DR, 1995, PLAT SURF FINISH, V82, P69
[12]   An investigation of copper interconnect deposition bath ageing by electrochemical impedance spectroscopy [J].
Gabrielli, C. ;
Mocoteguy, P. ;
Perrot, H. ;
Nieto-Sanz, D. ;
Zdunek, A. .
JOURNAL OF APPLIED ELECTROCHEMISTRY, 2008, 38 (04) :457-468
[13]   A model for copper deposition in the damascene process -: Application to the aging of the deposition bath [J].
Gabrielli, C. ;
Mocoteguy, P. ;
Perrot, H. ;
Zdunek, A. ;
Sanz, D. Nieto .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (01) :D13-D20
[14]   A model for copper deposition in the damascene process [J].
Gabrielli, C ;
Moçotéguy, P ;
Perrot, H ;
Nieto-Sanz, D ;
Zdunek, A .
ELECTROCHIMICA ACTA, 2006, 51 (8-9) :1462-1472
[15]   Mechanism of copper deposition in a sulphate bath containing chlorides [J].
Gabrielli, C ;
Moçotéguy, P ;
Perrot, H ;
Wiart, R .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2004, 572 (02) :367-375
[16]   Electrochemical impedance spectroscopy investigation of bath aging in damascene process chemistries [J].
Gabrielli, C ;
Mocoteguy, P ;
Perrot, H ;
Zdunek, A ;
Bouard, P ;
Haddix, M .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2004, 7 (03) :C31-C34
[17]  
Gabrielli C., 1995, PHYS ELECTROCHEMISTR, P243
[18]  
GABRIELLI C, 2003, COPPER INTERCONNECTS
[19]   Voltammetric study of the inhibition effect of polyethylene glycol and chloride ions on copper deposition [J].
Garrido, M. E. Huerta ;
Pritzker, M. D. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (04) :D332-D339
[20]  
GREHEV T, 1991, ELECT CHIM ACTA, V36, P1315