Design of front emitter layer for improving efficiency in silicon heterojunction solar cells via numerical calculations

被引:8
|
作者
Kim, Sehyeon [1 ]
Park, Hyeongsik [1 ,2 ]
Pham, Duy Phong [1 ]
Kim, Youngkuk [1 ]
Kim, Sangho [3 ,4 ]
Cho, Eun-Chel [1 ]
Cho, Younghyun [1 ]
Yi, Junsin [1 ]
机构
[1] Sungkyunkwan Univ, Coll Informat & Commun Engn, 2066 Seobu Ro, Suwon 16419, South Korea
[2] Sungkyunkwan Univ, Convergence Res Ctr Energy & Environm Sci, 2066 Seobu Ro, Suwon 16419, South Korea
[3] Incheon Natl Univ, Photoelect & Energy Device Applicat Lab PEDAL, Multidisciplinary Core Inst Future Energies MCIFE, 119 Acad Rd, Incheon, South Korea
[4] Incheon Natl Univ, Dept Elect Engn, 119 Acad Rd, Incheon 22012, South Korea
来源
OPTIK | 2021年 / 235卷 / 235期
基金
新加坡国家研究基金会;
关键词
VIPV; High efficiency; Silicon; Heterojunction; Emitter; AFORS-HET; HYDROGENATED AMORPHOUS-SILICON; TRANSPARENT CONDUCTIVE OXIDE; WORK FUNCTION; LIMITING EFFICIENCY; SI HETEROJUNCTION; THIN-FILM; CONTACT; PASSIVATION;
D O I
10.1016/j.ijleo.2021.166580
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
An a-Si:H (p) window layer is used in silicon heterojunction (SHJ) solar cells; however, it is limited by short-circuit current density (J(SC)). In general, an emitter with a high doping concentration is appropriate for contact with a transparent conducting oxide (TCO); however, it is influenced by side effects such as a reduction of J(SC) through optical absorption. The conductivity of the emitter is lowered as its doping concentration is reduced, resulting in a decrease in V-OC and FF. We investigated p-type emitters such as those made of a-Si:H, a-SiC:H, and mu c-SiO:H through film analysis and AFORS-HET simulation to improve the conversion efficiency of the device. Prior to conducting a simulation, a fabricated SHJ solar cell was used to theoretically calculate the precise parameter values. The obtained efficiency was 22.03 % when V-OC=730 mV, J(SC)=39.63 mA/cm(2), and FF = 76.13 %. Based on the fitted structure, we conducted experiments to test the emitter materials within a wide band gap and performed a simulation. In the case of mu c-SiO:H (p), the achieved efficiency was 24.23 % when V-OC=736.6 mV, J(SC)=40.15 mA/cm(2), and FF = 81.93 %.
引用
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页数:9
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