The conductive thin films of ferric chloride doped poly(3,4-ethylenedioxythiophene) (PEDOT: Fig. 1) were obtained by in situ vapor-pbase polymerization method under ambient conditions. Homogeneous thin conductive PEDOT films were uniformly fabricated at nano-level thickness (20-300nm) on the substrates. The surface resistance of the PEDOT films with 300nm thick was enhanced up to 500 Omega/sq, and the light transmittance were also increased as up to 95% in case of a film below 40 nm thick. The growth of highly ordered conductive PEDOT crystalline microstructure, which high anisotropy, parallel to the substrate film fabricated above 60 degreesC, was observed by atomic force microscopy (AFM). (C) 2003 Elsevier Science B.V. All rights reserved.
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MIT, Dept Chem Engn, Cambridge, MA 02139 USA
MIT, David H Koch Inst Integrat Canc Res, Cambridge, MA 02139 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
D'Arcy, Julio M.
El-Kady, Maher F.
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Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USA
Cairo Univ, Dept Chem, Fac Sci, Giza 12613, EgyptMIT, Dept Chem Engn, Cambridge, MA 02139 USA
El-Kady, Maher F.
Khine, Pwint P.
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Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Khine, Pwint P.
Zhang, Linghong
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Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Zhang, Linghong
Lee, Sun Hwa
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MIT, Dept Chem Engn, Cambridge, MA 02139 USA
MIT, David H Koch Inst Integrat Canc Res, Cambridge, MA 02139 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Lee, Sun Hwa
Davis, Nicole R.
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MIT, Dept Chem Engn, Cambridge, MA 02139 USA
MIT, David H Koch Inst Integrat Canc Res, Cambridge, MA 02139 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Davis, Nicole R.
Liu, David S.
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MIT, Dept Chem Engn, Cambridge, MA 02139 USA
MIT, David H Koch Inst Integrat Canc Res, Cambridge, MA 02139 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Liu, David S.
Yeung, Michael T.
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Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Yeung, Michael T.
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Kim, Sung Yeol
Turner, Christopher L.
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Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Turner, Christopher L.
Lech, Andrew T.
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Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Lech, Andrew T.
Hammond, Paula T.
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MIT, Dept Chem Engn, Cambridge, MA 02139 USA
MIT, David H Koch Inst Integrat Canc Res, Cambridge, MA 02139 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
Hammond, Paula T.
Kaner, Richard B.
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Univ Calif Los Angeles, Dept Mat Sci, Los Angeles, CA 90095 USAMIT, Dept Chem Engn, Cambridge, MA 02139 USA
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Kongju Natl Univ, Div Adv Mat Engn, Cheonan Si 314701, Chungnam, South KoreaKongju Natl Univ, Div Adv Mat Engn, Cheonan Si 314701, Chungnam, South Korea