Reduction of (Meth)acrylate-Based Block Copolymers Provides Access to Self-Assembled Materials with Ultrasmall Domains

被引：37

作者：

Zhang, Wenxu ^{[1
]}

Huang, Mingjun ^{[1
]}

al Abdullatif, Sarah ^{[1
]}

Chen, Mao ^{[1
]}

Shao-Horn, Yang ^{[2
,3
]}

Johnson, Jeremiah A. ^{[1
]}

机构：

[1] MIT, Dept Chem, Cambridge, MA 02143 USA

[2] MIT, Dept Mech Engn, Res Lab Elect, Cambridge, MA 02143 USA

[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02143 USA

来源：

MACROMOLECULES | 2018年 / 51卷 / 17期

关键词：

ORDER-DISORDER TRANSITION; INTERACTION PARAMETER; TRIBLOCK COPOLYMER; LITHOGRAPHIC APPLICATIONS; LAMELLAR MICRODOMAINS; MICROPHASE SEPARATION; STAR COPOLYMERS; THIN-FILMS; NM DOMAINS; POLYMERS;

D O I：

10.1021/acs.macromol.8b01588

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

To enable future applications of block copolymer assemblies, it is critical to develop simple approaches to achieve ultrasmall domain spacings from readily available polymers. In this report, we demonstrate that reduction of polymethyl(meth)acrylate-containing block copolymers with LiAlH4 provides novel poly(hydroxyisobutylene)/poly(methallyl alcohol) and poly(hydroxypropylene)/poly(allyl alcohol))-based block copolymers that after thermal annealing display significantly enhanced microphase separation. The effective chi values for these polymers were found to be >= 0.3, and d-spacing values as small as 6.5-7.2 nm were obtained for various morphologies. This work establishes a simple and universal strategy for generation of high chi block copolymers from readily available precursors.

引用

页码：6757 / 6763

页数：7

共 55 条

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