Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses

被引：32
作者：
Grisham, M [1 ]
Vaschenko, G
Menoni, CS
Rocca, JJ
Pershyn, YP
Zubarev, EN
Voronov, DL
Sevryukova, VA
Kondratenko, VV
Vinogradov, AV
Artioukov, IA
机构：
[1] Colorado State Univ, Natl Sci Fdn Engn Res Ctr Extreme Ultraviolet Sci, Ft Collins, CO 80523 USA
[2] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA
来源：
OPTICS LETTERS | 2004年 / 29卷 / 06期
关键词：
D O I：
10.1364/OL.29.000620
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of similar to0.08 J/cm(2) are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications. (C) 2004 Optical Society of America.
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页码：620 / 622
页数：3
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