One-step microfabrication of fused silica by laser ablation of an organic solution

被引：222

作者：

Wang, J ^{[1
]}

Niino, H ^{[1
]}

Yabe, A ^{[1
]}

机构：

[1] Natl Inst Mat & Chem Res, Tsukuba, Ibaraki 3058565, Japan

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1999年 / 68卷 / 01期

关键词：

D O I：

10.1007/s003390050863

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have developed a one-step technique to fabricate a well-defined pattern of lines and spaces in fused silica with micro-sized features, using laser-induced backside wet etching (LIBWE). The etch rate ranged from 5 to 25 nm/pulse with KrF laser irradiation from 400 to 1300 mJ/cm(2) and an acetone solution containing pyrene at a concentration of 0.4 mol/dm(3). The threshold fluence was 240 mJ/cm(2), which is about one-fortieth lower than that obtained with conventional KrF laser ablation.

引用

页码：111 / 113

页数：3

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