Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing

被引：144

作者：

Zhang, Xiaojiang ^{[1
,2
]}

Harris, Kenneth D. ^{[1
]}

Wu, Nathanael L. Y. ^{[1
,3
]}

Murphy, Jeffrey N. ^{[1
]}

Buriak, Jillian M. ^{[1
,2
]}

机构：

[1] CNR, Natl Inst Nanotechnol, Edmonton, AB T6G 2M9, Canada

[2] Univ Alberta, Dept Chem, Edmonton, AB T6G 2G2, Canada

[3] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2G8, Canada

来源：

ACS NANO | 2010年 / 4卷 / 11期

基金：

加拿大自然科学与工程研究理事会;

关键词：

block copolymer; solvothermal annealing; self assembly; patterning; microwaves; platinum nanostructures; silicon; substrate; graphoepitaxy; ELECTRIC-FIELD; CHEMICAL FUNCTIONALIZATION; NANOLITHOGRAPHY; LITHOGRAPHY; ALIGNMENT; LIMITS; GRAPHOEPITAXY; MECHANISMS; DOMAINS; PATTERN;

D O I：

10.1021/nn102387c

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Block copolymer self assembly is an innovative technology capable of patterning technologically relevant substrates with nanoscale precision for a range of applications Train integrated circuit fabrication to tissue block copolymer structures The technique Involves the usage of a commercial microwave reactor to anneal block copolymer films in the presence of appropriate solvents, and we explore the effect of various parameters over the polymer assembly speed and defect density The approach Is applied to,the commonly used poly(styrene)-b poly(methyl methacrylate) (PS b PMMA) and poly(styrene) b-poly(2 vinylpyridine) (PS-b-P2VP) families of block copolymers; and it is found that the substrate resistivity, solvent environment, and anneal temperature all critically influence the self assembly process For selected systems, highly ordered patterns Were achieved In lens than 3 min In addition, we establish the technique with directed assembly by graphoepitaxy

引用

页码：7021 / 7029

页数：9

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