Cross sectional evaluation of boron doping and defect distribution in homoepitaxial diamond layers

被引:6
作者
Araujo, Daniel [1 ]
Paz Alegre, M. A. [1 ]
Garcia, Antonio J. [1 ]
Pilar Villar, M. [1 ]
Bustarret, Etienne [2 ,3 ]
Achatz, Philipp [2 ,3 ]
Volpe, Pierre N. [2 ,3 ]
Omnes, Franck [2 ,3 ]
机构
[1] Univ Cadiz, Dpto Ciencia Mat, Cadiz 11510, Spain
[2] CNRS, Inst Neel, F-38041 Grenoble, France
[3] UJF, F-38041 Grenoble, France
来源
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 4 | 2011年 / 8卷 / 04期
关键词
homoepitaxial diamond; boron-doped; TEM; HAADF; CL;
D O I
10.1002/pssc.201083991
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In some diamond-based semiconducting devices, large variations of doping level are required over short distances. Tools to determine doping level and defects distribution should therefore be developed. The present contribution shows the capabilities of electron microscopy in this field. Focused ion beam (FIB-dual beam) cross section preparations allowed evaluating doping level in highly boron doped sample with doping transition down to some nm by diffraction contrast mode of transmission electron microscopy (CTEM) and by high angle annular dark field mode of scanning transmission electron microscopy (HAADF-STEM). The sensibility of the latter is around 10(19)cm(-3) and, thus, cathodo-luminescence (CL) is required for lower doping levels. Cross sectional analysis on FIB prepared lamella allowed to separate the epilayer behaviour from that of the substrate. Mid-gap centers involving boron, hydrogen and, for some peaks, also nitrogen are revealed. sp(2) bonds are also present in the grown epilayer. These transitions make difficult the observation of excitonic recombinations in the cross section configuration. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:1366 / 1370
页数:5
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