Emission pattern of real vapor sources in high vacuum: an overview

被引：23

作者：

Villa, F ^{[1
]}

Pompa, O ^{[1
]}

机构：

[1] Ctr Invest Opt, Leon 37000, Spain

来源：

APPLIED OPTICS | 1999年 / 38卷 / 04期

关键词：

D O I：

10.1364/AO.38.000695

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Emission characteristics of real vapor sources are analyzed on the basis of experimental results. It is found that some real sources have complex emission behaviors that agree only with a model that assumes a virtual surface instead of the real one. (C) 1999 Optical Society of America OCIS codes: 310.0310, 310.1860, 310.3840.

引用

页码：695 / 703

页数：9