Deposition of electro-optics and ferroelectric oxides by pulsed laser ablation

Pulsed laser deposition technique is very well suited for thin film preparation of multicomponent oxides. It has been applied to the deposition of superconductor, ferroelectric and electrooptics oxides. The main advantages of the technique are briefly summarised in this review, moreover some physical mechanisms leading to a film composition departure from the target one are analysed. Particular attention is paid on the laser-induced modification of the target, scattering in the plume, film diffusion into the substrate and reevaporation from the film. These phenomena are illustrated with niobate and lead titanate oxides. The proper understanding of these phenomena allows the optimisation of the deposition parameters to achieve specific crystalline films suited for some microelectronics and optical applications.