Optical through-focus technique that differentiates small changes in line width, line height and sidewall angle for CD, overlay, and defect metrology applications

被引:15
作者
Attota, Ravikiran [1 ]
Silver, Richard [1 ]
Barnes, Bryan M. [2 ]
机构
[1] NIST, Gaithersburg, MD 20899 USA
[2] KT Consulting Inc, Antioch, CA USA
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2 | 2008年 / 6922卷 / 1-2期
关键词
through-focus image map; optical CD (OCD) metrology; overlay; defect analysis; library matching; optical microscope; optical inspection; process control;
D O I
10.1117/12.777205
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope. We present a method to create through-focus image maps (TFIM) using optical images, which we believe unique for a given target. Based on this we present a library matching method that enables us to determine all the dimensions of an unknown target. Differential TFIMs of two targets are distinctive for different dimensional differences and enable us to uniquely identify the dimension that is different between them. We present several supporting examples using optical simulations and experimental results. This method is expected to be applicable to a wide variety of targets and geometries.
引用
收藏
页数:12
相关论文
共 12 条
[1]   Application of through-focus focus-metric analysis in high resolution optical metrology [J].
Attota, R ;
Silver, RM ;
Germer, TA ;
Bishop, M .
Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3, 2005, 5752 :1441-1449
[2]   Evaluation of new in-chip and arrayed line overlay target designs [J].
Attota, R ;
Silver, RM ;
Bishop, M ;
Marx, E ;
Jun, J ;
Stocker, M ;
Davidson, M ;
Larrabee, R .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVIII, PTS 1 AND 2, 2004, 5375 :395-402
[3]  
ATTOTA R, 2006, P SPIE, V6289
[4]   Linewidth measurement technique using through-focus optical images [J].
Attota, Ravikiran ;
Silver, Richard ;
Dixson, Ronald .
APPLIED OPTICS, 2008, 47 (04) :495-503
[5]  
DAVIDSON MP, 1991, MICRO ENGN, V13, P523
[6]   Through-focus technique for grating linewidth analysis with nanometer sensitivity [J].
Ku, Yi-Sha ;
Liu, An-Shun ;
Smith, Nigel .
OPTICAL ENGINEERING, 2006, 45 (12)
[7]   Through-focus technique for nano-scale grating pitch and linewidth analysis [J].
Ku, YS ;
Liu, AS ;
Smith, N .
OPTICS EXPRESS, 2005, 13 (18) :6699-6708
[8]  
LIU AS, 2005, P SOC PHOTO-OPT INS, V5908, P383
[9]  
PISTOR TV, 2001, UCBERLM0119
[10]   Scatterometry for CD measurements of etched structures [J].
Raymond, CJ ;
Naqvi, SSH ;
McNeil, JR .
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X, 1996, 2725 :720-728