Computer study of boron and phosphorus at the Si(100)-2x1 surface

被引:4
|
作者
Zavodinsky, VG [1 ]
Kuyanov, IA [1 ]
Chukurov, EN [1 ]
机构
[1] Russian Acad Sci, Inst Automat, Far Eastern Branch, Vladivostok 690041, Russia
来源
EUROPEAN PHYSICAL JOURNAL B | 1998年 / 6卷 / 02期
关键词
D O I
10.1007/s100510050549
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The AM1 semiempirical numerical method combined with the geometry optimization procedure was used to study the energetics of active impurities (B, P) in substitutional positions at the Si(100)-2 x 1 surface. It has been found that phosphorus prefers to be in the first layer (in dimers). Boron has the lowest energy in the second layer. Energy profits, counting from the fourth bulk-like layer, for B and P are 1.33 eV and 0.56 eV, respectively. Comparing of the P-Si and P-P dimers energetics has shown that P-Si dimers are more preferable energetically.
引用
收藏
页码:273 / 276
页数:4
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