Spatial distribution of H atom density in high-density, helicon-wave H2 plasmas measured by laser-induced fluorescence

被引:1
作者
Nakamoto, M [1 ]
Sasaki, K [1 ]
Kadota, K [1 ]
机构
[1] Nagoya Univ, Dept Elect, Nagoya, Aichi 4648603, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 5A期
关键词
H atom density; spatial distribution; transport; kinetics; gas heating; laser-induced fluorescence;
D O I
10.1143/JJAP.40.3431
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spatial distributions of H atom density in high-density, helicon-wave H-2 plasmas were measured by (2 + 1)-photon laser-induced fluorescence spectroscopy. In low-power, high-pressure discharges, hill-type distributions, i.e., the H atom density in the plasma column was higher than that in the outside region, were observed. The hill-type density distribution can be explained by known mechanisms of gas-phase reactions, diffusion, and surface loss of H atoms. On the other hand, in high-power, low-pressure discharges, deep dips were observed in the spatial distribution of the H atom density. The dip region corresponded to the location of the plasma column, suggesting significant heating of H atoms.
引用
收藏
页码:3431 / 3432
页数:2
相关论文
共 10 条
  • [2] CLARENBACH B, 2000, P 15 EUR C AT MOL PH, P60
  • [3] JANEV RK, 1987, ELEMENTARY PROCESSES
  • [4] REID RC, 1977, PROPERTIES GASES LIQ, P544
  • [5] ROUSSEAU A, 2000, P 15 EUR C AT MOL PH, P354
  • [6] Surface production of CF, CF2, and C2 radicals in high-density CF4/H2 plasmas
    Sasaki, K
    Furukawa, H
    Kadota, K
    Suzuki, C
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (10) : 5585 - 5591
  • [7] SASAKI K, IN PRESS REV SCI INS
  • [8] Surface productions of CF and CF2 radicals in high-density fluorocarbon plasmas
    Suzuki, C
    Sasaki, K
    Kadota, K
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04): : 2222 - 2226
  • [9] Formation of C2 radicals in high-density C4F8 plasmas studied by laser-induced fluorescence
    Suzuki, C
    Sasaki, K
    Kadota, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (12A): : 6896 - 6901
  • [10] Characteristics of C3 radicals in high-density C4F8 plasmas studied by laser-induced fluorescence spectroscopy
    Takizawa, K
    Sasaki, K
    Kadota, K
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (11) : 6201 - 6206