Wafer stage assembly for ion projection lithography

被引：2

作者：

Damm, C

Peschel, T

Risse, S

Kirschstein, UC

机构：

[1] Fraunhofer Inst Angew Opt & Feinmech Jena, IOF, D-07745 Jena, Germany

[2] Leica Microsyst Lithog GmbH, D-07745 Jena, Germany

来源：

MICROELECTRONIC ENGINEERING | 2001年 / 57-8卷

关键词：

wafer stage; metrology unit; electrostatic chuck; glass ceramics; lithography; ion projection lithography;

D O I：

10.1016/S0167-9317(01)00513-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In the framework of the Ion Projection Lithography project a wafer stage with nanometer position stability was developed. Major components were fabricated from glass ceramics to meet the requirements for mechanical and thermal stability as well as for minimum magnetic susceptibility. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：181 / 185

页数：5