Comparison on TiO2 thin film deposition method for fluidic based glucose memristor sensor

This paper studies the behavior of fluidic based memristor sensor in detecting glucose liquid. Two types of memristor sensors were produced using two different deposition methods which were physical vapor deposition (PVD) method and sol-gel spin coating method. The equipment used in doing the PVD was radio frequency (RF) sputtering machine, and normal spin coating machine was employed for the sol-gel deposition. The memristor sensors were then tested with three glucose concentrations in a fluidic based platform. An observation showed that the ROFF/RoN ratio of the sol gel spin coating memristor sensor was higher than the PVD memristor sensor. The increment in the concentration of the glucose liquid also raised the ratio for both deposition methods. The sol-gel spin coating deposition recorded an exponential relationship between its ROFF/RoN ratio to the glucose concentration while a linear relationship was observed in PVD method for the same parameters. As conclusion, the sol-gel spin coating method has more advantages than the PVD method due to its high sensing capability, shorter deposition time and lower cost.