Surface conversion reaction and high efficient grinding of CVD diamond films by chemically mechanical polishing

被引:27
作者
Xu, Hanqing [1 ]
Zang, Jianbing [1 ]
Tian, Pengfei [1 ]
Yuan, Yungang [1 ]
Wang, Yanhui [1 ]
Yu, Yiqing [2 ]
Lu, Jing [2 ]
Xu, Xipeng [2 ]
Zhang, Pingwei [3 ]
机构
[1] Yanshan Univ, State Key Lab Metastable Mat Sci & Technol, Sch Mat Sci & Engn, Qinhuangdao 066004, Peoples R China
[2] Huaqiao Univ, MOE Engn Res Ctr Brittle Mat Machining, Xiamen 361021, Peoples R China
[3] Hebei Plasma Diamond Technol Co Ltd, Hebei Inst Laser, Shijiazhuang 050000, Hebei, Peoples R China
基金
美国国家科学基金会;
关键词
Diamond film; Grinding; Chemical mechanical polishing; Nanoindentation; NANOCRYSTALLINE DIAMOND; VAPOR-DEPOSITION; MATERIAL REMOVAL; FRICTION;
D O I
10.1016/j.ceramint.2018.08.247
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The competitive growth of crystals results in a rough diamond film, which prevents CVD diamond films from reaching their full potential in devices requiring a smooth film. To address the issue, a high-efficiency grinding wheel is developed by adding titanium into the vitrified bond wheel. The polished films have been characterized by stylus profilometer, Scanning Electron Microscopy, X-ray diffraction and nanoindentation. The results indicate that the hardness of the polished diamond film with adhesion layer has been reduced to 1.85 GPa, which enables highly efficient removal rate using Al2O3 abrasive. The material removal rate could reach 120.2 mu m h(-1) due to the formation of graphite and carbides (TiC) during the polishing process.
引用
收藏
页码:21641 / 21647
页数:7
相关论文
共 29 条
  • [21] Evaluation research of polishing methods for large area diamond films produced by chemical vapor deposition
    Tsai, H. Y.
    Ting, C. J.
    Chou, C. P.
    [J]. DIAMOND AND RELATED MATERIALS, 2007, 16 (02) : 253 - 261
  • [22] Wang ZC, 2013, IEEE TOP CONF POWER, P40, DOI 10.1109/PAWR.2013.6490182
  • [23] Fabrication of Silicon on Diamond (SOD) substrates by either the Bonded and Etched-back SOI (BESOI) or the Smart-Cut™ technology
    Widiez, J.
    Rabarot, M.
    Saada, S.
    Mazellier, J. -P.
    Dechamp, J.
    Delaye, V.
    Roussin, J. -C.
    Andrieu, F.
    Faynot, O.
    Deleonibus, S.
    Bergonzo, P.
    Clavelier, L.
    [J]. SOLID-STATE ELECTRONICS, 2010, 54 (02) : 158 - 163
  • [24] Nanocrystalline diamond
    Williams, O. A.
    [J]. DIAMOND AND RELATED MATERIALS, 2011, 20 (5-6) : 621 - 640
  • [25] Enhanced diamond nucleation on monodispersed nanocrystalline diamond
    Williams, Oliver A.
    Douheret, Olivier
    Daenen, Michael
    Haenen, Ken
    Osawa, Eiji
    Takahashi, Makoto
    [J]. CHEMICAL PHYSICS LETTERS, 2007, 445 (4-6) : 255 - 258
  • [26] An efficient titanium-containing corundum wheel for grinding CVD diamond films
    Xu, Hanqing
    Zang, Jianbing
    Yang, Guoping
    Tian, Pengfei
    Wang, Yanhui
    Yu, Yiqing
    Lu, Jing
    Xu, Xipeng
    Zhang, Pingwei
    [J]. DIAMOND AND RELATED MATERIALS, 2018, 84 : 119 - 126
  • [27] Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing
    Zhang, Zefang
    Yan, Weixia
    Zhang, Lei
    Liu, Weili
    Song, Zhitang
    [J]. MICROELECTRONIC ENGINEERING, 2011, 88 (09) : 3020 - 3023
  • [28] Thermal oxidation of CVD diamond
    Zolotukhin, Aleksey
    Kopylov, Petr G.
    Ismagilov, Rinat R.
    Obraztsov, Alexander N.
    [J]. DIAMOND AND RELATED MATERIALS, 2010, 19 (7-9) : 1007 - 1011
  • [29] [No title captured]