Surface conversion reaction and high efficient grinding of CVD diamond films by chemically mechanical polishing

被引：27

作者：

Xu, Hanqing ^{[1
]}

Zang, Jianbing ^{[1
]}

Tian, Pengfei ^{[1
]}

Yuan, Yungang ^{[1
]}

Wang, Yanhui ^{[1
]}

Yu, Yiqing ^{[2
]}

Lu, Jing ^{[2
]}

Xu, Xipeng ^{[2
]}

Zhang, Pingwei ^{[3
]}

机构：

[1] Yanshan Univ, State Key Lab Metastable Mat Sci & Technol, Sch Mat Sci & Engn, Qinhuangdao 066004, Peoples R China

[2] Huaqiao Univ, MOE Engn Res Ctr Brittle Mat Machining, Xiamen 361021, Peoples R China

[3] Hebei Plasma Diamond Technol Co Ltd, Hebei Inst Laser, Shijiazhuang 050000, Hebei, Peoples R China

来源：

CERAMICS INTERNATIONAL | 2018年 / 44卷 / 17期

基金：

美国国家科学基金会;

关键词：

Diamond film; Grinding; Chemical mechanical polishing; Nanoindentation; NANOCRYSTALLINE DIAMOND; VAPOR-DEPOSITION; MATERIAL REMOVAL; FRICTION;

D O I：

10.1016/j.ceramint.2018.08.247

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The competitive growth of crystals results in a rough diamond film, which prevents CVD diamond films from reaching their full potential in devices requiring a smooth film. To address the issue, a high-efficiency grinding wheel is developed by adding titanium into the vitrified bond wheel. The polished films have been characterized by stylus profilometer, Scanning Electron Microscopy, X-ray diffraction and nanoindentation. The results indicate that the hardness of the polished diamond film with adhesion layer has been reduced to 1.85 GPa, which enables highly efficient removal rate using Al2O3 abrasive. The material removal rate could reach 120.2 mu m h(-1) due to the formation of graphite and carbides (TiC) during the polishing process.

引用

页码：21641 / 21647

页数：7

共 29 条

[1] The CVD of nanodiamond materials
Butler, James E.
Sumant, Anirudha V.
[J]. CHEMICAL VAPOR DEPOSITION, 2008, 14 (7-8) : 145 - 160
[2] Polishing of polycrystalline diamond by the technique of dynamic friction. Part 2: Material removal mechanism
Chen, Y.
Zhang, L. C.
Arsecularatne, J. A.
[J]. INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE, 2007, 47 (10) : 1615 - 1624
[3] Childres I., 2013, New Developments in Photon and Materials Research
[4] Influence of surface modification on the quality factor of microresonators
Ergincan, O.
Palasantzas, G.
Kooi, B. J.
[J]. PHYSICAL REVIEW B, 2012, 85 (20):
[5] [黄树涛 HUANG Shu-tao], 2009, [人工晶体学报, Journal of Synthetic Crystals], V38, P1456
[6] Dissipation in nanoelectromechanical systems
Imboden, Matthias
Mohanty, Pritiraj
[J]. PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS, 2014, 534 (03): : 89 - 146
[7] MASSIVE THINNING OF DIAMOND FILMS BY A DIFFUSION PROCESS
JIN, S
GRAEBNER, JE
KAMMLOTT, GW
TIEFEL, TH
KOSINSKI, SG
CHEN, LH
FASTNACHT, RA
[J]. APPLIED PHYSICS LETTERS, 1992, 60 (16) : 1948 - 1950
[8] CLASSIFICATION OF METAL-CATALYSTS BASED ON SURFACE D-ELECTRONS
JOHNSON, O
[J]. JOURNAL OF CATALYSIS, 1973, 28 (03) : 503 - 505
[9] CHARACTERIZATION OF DIAMOND FILMS BY RAMAN-SPECTROSCOPY
KNIGHT, DS
WHITE, WB
[J]. JOURNAL OF MATERIALS RESEARCH, 1989, 4 (02) : 385 - 393
[10] Graphene Films with Large Domain Size by a Two-Step Chemical Vapor Deposition Process
Li, Xuesong
Magnuson, Carl W.
Venugopal, Archana
An, Jinho
Suk, Ji Won
Han, Boyang
Borysiak, Mark
Cai, Weiwei
Velamakanni, Aruna
Zhu, Yanwu
Fu, Lianfeng
Vogel, Eric M.
Voelkl, Edgar
Colombo, Luigi
Ruoff, Rodney S.
[J]. NANO LETTERS, 2010, 10 (11) : 4328 - 4334

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