Photo-assisted MOCVD growth of YBCO thick films for wire applications

被引：3
作者：
Ignatiev, A [1 ]
Chou, PC
Zhong, Q
Zhang, X
Chen, YM
机构：
[1] Univ Houston, Texas Ctr Superconduct, Houston, TX 77204 USA
[2] Univ Houston, Ctr Space Vacuum Epitaxy, Houston, TX 77204 USA
来源：
APPLIED SUPERCONDUCTIVITY | 1996年 / 4卷 / 10-11期
基金：
美国国家航空航天局;
关键词：
D O I：
10.1016/S0964-1807(97)00032-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Photo-assisted MOCVD has been applied to the fabrication of thick film YBa2Cu3O7-x, for wires and tapes. The application of photo-irradiation as the sole source of energy for the MOCVD reaction has resulted in extremely rapid growth rates for YBCO films with high superconducting performance. Typical YBCO films of thickness >1 mum exhibit J(c)similar to1 x 10(6) A cm(-2) and T-c>90 K on single crystal oxide substrates. Such films have now been integrated to metal substrates including both single crystal Ni(100) and roll-textured nickel foil. YBCO films grown on these substrates with CeO2 and YSZ buffer layers show J(c)>3 x 10(5) A cm(-2) for films of > 1 mum thickness grown in 2-4 min time. Such performance for thick films made in such a short time is promising for YBCO wire fabrication with optimization of the photo-assisted MOCVD process expected to yield J(c)>1 x 10(6) A cm(-2) for 1-5 mum thick YBCO films on flexible nickel substrates. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：455 / 463
页数：9
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