Molecular Lithography through DNA-Mediated Etching and Masking of SiO2

被引:83
作者
Surwade, Sumedh P. [1 ]
Zhao, Shichao [1 ,2 ]
Liu, Haitao [1 ]
机构
[1] Univ Pittsburgh, Dept Chem, Pittsburgh, PA 15260 USA
[2] Hangzhou Dianzi Univ, Coll Mat & Environm Engn, Hangzhou 310018, Zhejiang, Peoples R China
关键词
GOLD NANOPARTICLES; PATTERNED SURFACES; ORIGAMI; ARRAYS; ADSORPTION;
D O I
10.1021/ja2038886
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO2 at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO2 substrate.
引用
收藏
页码:11868 / 11871
页数:4
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