Nanocrystal-Embedded-Insulator Ferroelectric Negative Capacitance FETs With Sub-kT/q Swing

被引:23
作者
Peng, Yue [1 ]
Xiao, Wenwu [1 ,2 ]
Han, Genquan [1 ]
Wu, Jibao [1 ]
Liu, Huan [1 ]
Liu, Yan [1 ]
Xu, Nuo [3 ]
Liu, Tsu-Jae King [3 ]
Hao, Yue [1 ]
机构
[1] Xidian Univ, Sch Microelect, State Key Discipline Lab Wide Band Gap Semicond T, Xian 710071, Shaanxi, Peoples R China
[2] Xiangtan Univ, Sch Mat Sci & Engn, Xiangtan 411105, Peoples R China
[3] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
基金
中国国家自然科学基金;
关键词
Ferroelectric; nanocrystal; negative capacitance; FET; PFETS;
D O I
10.1109/LED.2018.2881839
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A novel nanocrystal-embedded-insulator (NEI) ferroelectric negative capacitance field-effect transistor (NCFET) is proposed and demonstrated. The NEI layer comprises orthorhombic ZrO2 nanocrystals embedded in amorphous Al2O3, as confirmed by high-resolution scanning transmission electron microscopy and diffraction analysis. The ferroelectric nature of NEI is proved by polarization-voltage measurements, piezoresponse force microscopy, and electrical measurements. The NEI NCFET achieves superior subthreshold swing (SS) and drive current compared with a control MOSFET with the same Al2O3 gate insulator thickness. Sub-60-mV/decade SS is also maintained through multiple DC sweeping cycles.
引用
收藏
页码:9 / 12
页数:4
相关论文
共 24 条
[1]  
[Anonymous], 1992, HIGH PRESSURE RES AP
[2]  
Chung W, 2017, INT EL DEVICES MEET
[3]   Nanocrystal nonvolatile memory devices [J].
De Blauwe, J .
IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2002, 1 (01) :72-77
[4]   Device-Circuit Analysis of Ferroelectric FETs for Low-Power Logic [J].
Gupta, Shreya ;
Steiner, Mark ;
Aziz, Ahmedullah ;
Narayanan, Vijaykrishnan ;
Datta, Suman ;
Gupta, Sumeet Kumar .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (08) :3092-3100
[5]   MOS memory using germanium nanocrystals formed by thermal oxidation of Si1-xGex [J].
King, YC ;
King, TJ ;
Hu, CM .
INTERNATIONAL ELECTRON DEVICES MEETING 1998 - TECHNICAL DIGEST, 1998, :115-118
[6]  
Krivokapic Z, 2017, INT EL DEVICES MEET, DOI 10.1109/IEDM.2017.8268393
[7]   Negative Capacitance Ge PFETs for Performance Improvement: Impact of Thickness of HfZrOx [J].
Li, Jing ;
Zhou, Jiuren ;
Han, Genquan ;
Liu, Yan ;
Peng, Yue ;
Zhang, Jincheng ;
Sun, Qing-Qing ;
Zhang, David Wei ;
Hao, Yue .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (03) :1217-1222
[8]   Enabling Energy-Efficient Nonvolatile Computing With Negative Capacitance FET [J].
Li, Xueqing ;
Sampson, John ;
Khan, Asif ;
Ma, Kaisheng ;
George, Sumitha ;
Aziz, Ahmedullah ;
Gupta, Sumeet Kumar ;
Salahuddin, Sayeef ;
Chang, Meng-Fan ;
Datta, Suman ;
Narayanan, Vijaykrishnan .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (08) :3452-3458
[9]   Design of Nonvolatile SRAM with Ferroelectric FETs for Energy-Efficient Backup and Restore [J].
Li, Xueqing ;
Ma, Kaisheng ;
George, Sumitha ;
Khwa, Win-San ;
Sampson, John ;
Gupta, Sumeet ;
Liu, Yongpan ;
Chang, Meng-Fan ;
Datta, Suman ;
Narayanan, Vijaykrishnan .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (07) :3037-3040
[10]  
Luc QH, 2018, 2018 IEEE SYMPOSIUM ON VLSI TECHNOLOGY, P47, DOI 10.1109/VLSIT.2018.8510644