Growth and structure of hydrogenated carbon films containing fullerene-like structure

Hydrogenated carbon films were prepared by magnetron sputtering of a titanium target in methane and argon atmosphere. The film grown at -800V bias exhibits excellent mechanical properties with a hardness of 20.9 GPa and an elastic recovery as high as 85%. Its structure, characterized by high-resolution transmission electron microscopy, Raman spectrum, and x-ray photoelectron spectroscopy, can be described as fullerene-like structures uniformly dispersed in an amorphous carbon matrix. In order to reveal the evolution of fullerene-like structures in our films, different bias voltages were introduced. The results show that high bias voltage leads to the accumulation of high compressive internal stress in the film and promotes the evolution of fullerene-like structures. Although the film grown at -800V bias presents high sp(2) bonding content, it exhibits good mechanical properties with high hardness and high elasticity at the same time; we attribute it to the unique structure of the film, in which a fullerene-like structure, just like a molecule spring dispersed in the film, reserves the elastic energy during distortion through reversible bond rotation and bond angle deflection, while the amorphous carbon matrix restrains the relaxation of the rigid C-C network and compressive stress and restricts the slip of graphene sheets.