Magnetic relaxation in thin Co films with in-plane magnetization

被引:10
作者
Boukari, S [1 ]
Allenspach, R [1 ]
Bischof, A [1 ]
机构
[1] IBM Corp, Div Res, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland
关键词
D O I
10.1103/PhysRevB.63.180402
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnetic relaxation along two nonequivalent axes has been investigated in Co films on stepped Cu(001) by magneto-optical Kerr effect and correlated to magnetic domain patterns and structural defects by spin-polarized scanning electron microscopy. The results show that nucleation is dominated by anisotropy rather than magnetostatics. Domain wall velocity is not constant for a given held. but depends on the initial state of the system.
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页数:4
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