Novel III-V/Si hybrid laser structures with current injection across conductive wafer-bonded heterointerfaces: A proposal and analysis

被引:7
作者
Tanabe, Katsuaki [1 ]
Iwamoto, Satoshi
Arakawa, Yasuhiko
机构
[1] Univ Tokyo, Inst Nano Quantum Informat Elect, Meguro Ku, Tokyo 1538505, Japan
来源
IEICE ELECTRONICS EXPRESS | 2011年 / 8卷 / 08期
关键词
semiconductor lasers; metals; wafer bonding; silicon photonics; SILICON; ABSORPTION;
D O I
10.1587/elex.8.596
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We propose two novel III-V/Si hybrid laser structures with patterned window arrays in metal thin film wafer-bonding layers. The metal-mediated bonded III-V/Si heterointerface exhibits high electrical and thermal conductivity while allowing optical coupling between the III-V gain layer and the underneath Si waveguide through the openings in the metal bonding layer. We numerically examine the validity of the proposed hybrid laser structures through calculations of their modal propagation loss by metal's absorption and threshold current densities. We also propose another hybrid laser structure utilizing conductive direct semiconductor/semiconductor wafer bonding exploiting a spatial gain profile well overlapped with the waveguide mode and no metal-induced loss relative to those metal-mediated-bonded. All of these three structures have advantages such as spontaneous lateral current confinement and simpler fabrication over conventional oxide-mediated-bonded hybrid lasers.
引用
收藏
页码:596 / 603
页数:8
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