Nanopatterning of self-assembled monolayers on Si-surfaces with AFM lithography

被引：18

作者：

Lee, WB ^{[1
]}

Oh, Y ^{[1
]}

Kim, ER ^{[1
]}

Lee, H ^{[1
]}

机构：

[1] Hanyang Univ, Dept Chem, Seoul 133791, South Korea

来源：

SYNTHETIC METALS | 2001年 / 117卷 / 1-3期

关键词：

1,12-diaminododecane; n-tridecylamine; self assembly; atomic force microscopy; nano-lithography; anodization;

D O I：

10.1016/S0379-6779(00)00392-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ammonium chloride-modified monolayer was prepared on negatively charged Si-wafer surfaces with 1,12-diaminododecane (DAD). 2HCl by self assembly method and methyl modified monolayer was prepared with n-tridecylamine (TDA). HCl. The nano-pattems of these monolayers at the various anodization conditions demonstrated that the anodic reaction on DAD . 2HCl monolayer has an enhancement effect to generate the protruding lines. The film thickness measurements suggest that DAD . 2HCl monolayer was assembled completely on negatively charged Si-wafer surface in 1 mM of DAD . 2HCl aqueous solution after 5 min. The completely assembled monolayer generated discrete and uniform protruding lines by atomic force microscopy (AFM) anodization. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：305 / 306

页数：2

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