Nanopatterning of self-assembled monolayers on Si-surfaces with AFM lithography

Ammonium chloride-modified monolayer was prepared on negatively charged Si-wafer surfaces with 1,12-diaminododecane (DAD). 2HCl by self assembly method and methyl modified monolayer was prepared with n-tridecylamine (TDA). HCl. The nano-pattems of these monolayers at the various anodization conditions demonstrated that the anodic reaction on DAD . 2HCl monolayer has an enhancement effect to generate the protruding lines. The film thickness measurements suggest that DAD . 2HCl monolayer was assembled completely on negatively charged Si-wafer surface in 1 mM of DAD . 2HCl aqueous solution after 5 min. The completely assembled monolayer generated discrete and uniform protruding lines by atomic force microscopy (AFM) anodization. (C) 2001 Elsevier Science B.V. All rights reserved.