Film Chemistry Control and Growth Kinetics of Pulsed Plasma-Polymerized Aniline

被引：51

作者：

Debarnot, Dominique ^{[1
]}

Merian, Tiphaine ^{[1
]}

Poncin-Epaillard, Fabienne ^{[1
]}

机构：

[1] Univ Maine, Lab Polymeres Colloides & Interfaces, CNRS, UMR 6120, F-72000 Le Mans, France

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 2011年 / 31卷 / 01期

关键词：

Pulsed discharge; Plasma polymerization; Aniline; Kinetics; Ring retention; THIN-FILMS; POLYANILINE FILMS; RF; CONDUCTIVITY; DEPOSITION; PYRROLE; STATE;

D O I：

10.1007/s11090-010-9271-2

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

The polymerization of aniline under continuous and pulsed RF-plasma conditions is studied using the same plasma reactor. The effects of input power, on and off-times, frequency and duty cycle variations on the growth kinetics and on the chemical structure of the obtained layers are examined. The chemical structure of the films is characterized using Fourier Transform Infra-Red, X-ray photoelectron and UltraViolet-Visible spectroscopies. The thickness of the films is determined by profilometry. The results show a strong dependence of film chemistry and deposition rates on the discharge power and on-time. The film deposited by pulsed plasma grows mainly during the plasma-on period. Furthermore, this work shows that the retention of aromatic rings can be evaluated by Fourier transform infrared analysis whereas oxidation degree of plasma polyaniline can be determined by X-ray photoelectron and UV-Vis spectroscopies.

引用

页码：217 / 231

页数：15

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