Effect of sputtering parameters and sample size on giant magnetoimpedance effect in NiFe and NiFe/Cu/NiFe films

被引：20

作者：

Chen, Lei ^{[1
]}

Zhou, Yong ^{[1
]}

Lei, Chong ^{[1
]}

Zhou, Zhi-Min ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Natl Key Lab Nano Micro Fabricat Technol, Key Lab Thin Film & Microfabricat, Minist Educ,Inst Micro & Nano Sci & Technol, Shanghai 200240, Peoples R China

来源：

MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2010年 / 172卷 / 02期

关键词：

Giant magnetoimpedance; NiFe thin film; Sputtering parameters; Sample size; MAGNETO-IMPEDANCE; GMI; SENSOR;

D O I：

10.1016/j.mseb.2010.04.026

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

NiFe single layered films and NiFe/Cu/NiFe sandwich films are fabricated by MEMS technology to investigate the influence of sputtering parameters and sample size on the giant magnetoimpedance (GMI) effect in thin films. Optimal sputtering parameters are selected based on the GMI ratio and magnetization curves of the different single layered thin films. The maximum GMI ratio of 15% is observed in NiFe/Cu/NiFe sandwich film with a length of 4 mm, the NiFe layer width of 100 mu m and the Cu layer width of 40 mu m. The result shows that GMI effect of thin films can be significantly improved by proper sputtering parameters, well-designed sample size and sandwich structure. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：101 / 107

页数：7

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