Production of Silicon-based Nano-scale Materials Through High Temperature Reduction of Silica by Titanium

被引：0

作者：

Terakado, Osamu ^{[1
]}

Nagata, Takeshi ^{[1
]}

Fujimoto, Yoshinori ^{[1
]}

Hirasawa, Masahiro ^{[1
]}

机构：

[1] Nagoya Univ, Grad Sch Engn, Dept Mat Sci & Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan

来源：

HIGH TEMPERATURE MATERIALS AND PROCESSES | 2011年 / 30卷 / 4-5期

关键词：

Silicon; nano-materials; high temperature reduction; silica; titanium; CARBOTHERMIC REDUCTION; CONTAINING SLAG; DISPROPORTIONATION; SIO;

D O I：

10.1515/HTMP.2011.058

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The reduction of silica by titanium at 2073 K has been studied in order to develop a production process of silicon-based nano-scale materials. The silicon monoxide vapour, reaction intermediate products, has been transferred by argon carrier gas to colder parts of the reactor, which results in the disproportionation reaction to form Si and SiO2. The products include particles with diameter of 10-100 nm order and wires. An attempt to remove SiO2 by hydrofluoric acid treatment of the reduction products resulted in the enrichment of Si particles.

引用

页码：367 / 372

页数：6

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