Role of pH of precursor solution in taming the material properties of spray pyrolysed SnS thin films

被引:32
作者
Sajeesh, T. H. [1 ]
Jinesh, K. B. [2 ]
Kartha, C. Sudha [1 ]
Vijayakumar, K. P. [1 ]
机构
[1] Cochin Univ Sci & Technol, Dept Phys, Cochin 682022, Kerala, India
[2] Nanyang Technol Univ, ERI N, Singapore 639798, Singapore
关键词
Chemical spray pyrolysis; Photovoltaic; Compound semiconductors; Thin films; Opto-electronic properties; Structural properties; PHYSICAL-PROPERTIES; DEPOSITION; THICKNESS; GROWTH;
D O I
10.1016/j.apsusc.2012.03.121
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Samples were deposited using chemical spray pyrolysis technique by varying the pH of the starting precursor solution from 0.8 to 3.2. These samples were analyzed using X-ray diffraction, optical absorption spectroscopy, energy dispersive X-ray analysis, scanning electron microscopy, and electrical measurements in order to investigate the role of pH of the precursor solution on structural, morphological, electrical and optical properties of the SnS films. From the study we could optimize the pH of precursor solution required for the deposition of device quality SnS thin films. Resistivity of the films was brought down by three orders (to 6 x 10(-2) Omega cm) along with enhancement in grain size as well as photosensitivity by optimizing the pH of the precursor solution alone. Band gap of the films could also be tailored by controlling the pH of the precursor solution. (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码:6870 / 6875
页数:6
相关论文
共 29 条
  • [1] Effect of deposition time on physical properties of nanocrystallized SnS zinc blend thin films grown by chemical bath deposition
    Akkari, Anis
    Regima, Meriem
    Guasch, Cathy
    Kamoun-Turki, Najoua
    [J]. ADVANCES IN INNOVATIVE MATERIALS AND APPLICATIONS, 2011, 324 : 101 - +
  • [2] Barman J, 2008, CHALCOGENIDE LETT, V5, P265
  • [3] Brennan J., 1997, SINGLE SOURCE METALL
  • [4] EFFECT OF PH OF THE SOLUTION ON THE DEPOSITION OF ZINC-OXIDE FILMS BY SPRAY-PYROLYSIS
    CAILLAUD, F
    SMITH, A
    BAUMARD, JF
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1993, 76 (04) : 998 - 1002
  • [5] Influence of thickness on structural and optical properties of evaporated tin sulphide films
    Cheng, Shuying
    Zhang, Hong
    [J]. MICRO & NANO LETTERS, 2011, 6 (07) : 473 - 475
  • [6] Thickness effect on the physical properties of evaporated SnS films
    Devika, M.
    Reddy, N. Koteeswara
    Ramesh, K.
    Ganesan, R.
    Gunasekhar, K. R.
    Gopal, E. S. R.
    Reddy, K. T. Ramakrishna
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (02) : H67 - H73
  • [7] Low resistive micrometer-thick SnS:Ag films for optoelectronic applications
    Devika, M.
    Reddy, N. Koteeswara
    Ramesh, K.
    Gunasekhar, K. R.
    Gopal, E. S. R.
    Reddy, K. T. Ramakrishna
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2006, 153 (08) : G727 - G733
  • [8] Microstructure dependent physical properties of evaporated tin sulfide films
    Devika, M.
    Reddy, K. T. Ramakrishna
    Reddy, N. Koteeswara
    Ramesh, K.
    Ganesan, R.
    Gopal, E. S. R.
    Gunasekhar, K. R.
    [J]. JOURNAL OF APPLIED PHYSICS, 2006, 100 (02)
  • [9] Optimization of the distance between source and substrate for device-grade SnS films grown by the thermal evaporation technique
    Devika, M.
    Reddy, N. Koteeswara
    Reddy, D. Sreekantha
    Reddy, S. Venkatramana
    Ramesh, K.
    RGopal, E. S.
    Gunasekhar, K. R.
    Ganesan, V.
    Hahn, Y. B.
    [J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 2007, 19 (30)
  • [10] Dhanasekaran V., 2011, THIN FILMS J ADV MIC, V6, P126