Comprehensive Data Collection Device for Plasma Equipment Intelligence Studies

In this study, various diagnostic tools were constructed and plasma factors measured to evaluate the intelligence of plasma process equipment. We used an ICP (Inductively Coupled Plasma) reactor with a radio frequency (RF) power of 13.56 MHz, a power of 400 to 800 W, and a pressure of 10 to 30 mTorr. Plasma parameters such as electron density (n(e)), electron temperature (T-e), plasma potential (V-p), and floating potential (V-f) were measured using several instruments (VI probe and mass/energy analyzer, etc.) and subsequently analyzed. Regression analysis was performed to correlate the measured data with the plasma parameters. As a result, the plasma density (n(e)) and temperature (T-e) were observed to be in good agreement with the non-invasive measurement results. In particular, the VI probes were highly correlated with almost all the measured plasma parameters. Therefore, the results of this study provide a basis for the estimation of plasma parameters using non-invasive measurement techniques.