Metal-insulator transition in 2D: resistance in the critical region

被引:90
|
作者
Altshuler, BL
Maslov, DL
Pudalov, VM
机构
[1] PN Lebedev Phys Inst, Moscow 117924, Russia
[2] NEC Res Inst, Princeton, NJ 08540 USA
[3] Princeton Univ, Dept Phys, Princeton, NJ 08544 USA
[4] Univ Florida, Dept Phys, Gainesville, FL 32611 USA
基金
美国国家科学基金会; 俄罗斯基础研究基金会;
关键词
metal-insulator transition; two-dimensional carrier system;
D O I
10.1016/S1386-9477(00)00167-3
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The goal of this paper is to highlight several issues which are most crucial for the understanding of the "metal-insulator transition" in two dimensions. We discuss some common problems in interpreting experimental results on high-mobility Si MOSFETs. We analyze concepts and methods used to determine the critical density of electrons at the metal-insulator transition. In particular, we discuss the origin of the temperature dependence of the resistivity and reasons for this dependence to flatten out at some electron density in the vicinity of the metal-insulator transition. This flattening has recently been proposed to indicate a true quantum phase transition. We suggest an alternative interpretation of this result and demonstrate the consistency of our proposition with the experimental data. One of the main questions. which arise in connection with the transition, is whether or not the metallic state is qualitatively distinct from a conventional disordered Fermi liquid. We analyze the arguments in favor of both affirmative and negative answers to this question and conclude that the experimental results accumulated up-to-date do not provide convincing evidence for the new state of matter characterized by a metallic-like residual conductivity. We also discuss in details the measurement and control of the electron temperature; these issues are crucial for interpreting the low-temperature experimental data. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:209 / 225
页数:17
相关论文
共 50 条
  • [11] Hopping conductivity and percolation-type transport near the 2D metal-insulator transition
    Kim, NJ
    Washburn, S
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2005, 46 (04) : 895 - 900
  • [12] Metal-insulator transition in MnS
    Chernov, Evgenii D.
    Lukoyanov, Alexey, V
    PHYSICA SCRIPTA, 2025, 100 (03)
  • [13] The metal-insulator transition: A perspective
    Edwards, PP
    Johnston, RL
    Rao, CNR
    Tunstall, DP
    Hensel, F
    PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1998, 356 (1735): : 5 - 22
  • [14] Low-Temperature 2D/2D Ohmic Contacts in WSe2 Field-Effect Transistors as a Platform for the 2D Metal-Insulator Transition
    Stanley, Lily J.
    Chuang, Hsun-Jen
    Zhou, Zhixian
    Koehler, Michael R.
    Yan, Jiaqiang
    Mandrus, David G.
    Popovic, Dragana
    ACS APPLIED MATERIALS & INTERFACES, 2021, 13 (08) : 10594 - 10602
  • [15] Evolution of the d|| band across the metal-insulator transition in VO2
    Mossanek, RJO
    Abbate, M
    SOLID STATE COMMUNICATIONS, 2005, 135 (03) : 189 - 192
  • [16] Study of the critical density of the metal-insulator transition in two dimensional systems
    Limouny, Lhoussne
    El Kaaouachi, Abdelhamid
    Dlimi, Said
    Daoudi, El Fatmi
    Sybous, Abdeghani
    Narjis, Abdelfattah
    Errai, Mohamed
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2013, 15 (11-12): : 1303 - 1305
  • [17] Combined effects of disorders and electron-electron interactions upon metal-insulator transition in 2D nonbipartite lattice
    Wang, JX
    Kais, S
    PHYSICS LETTERS A, 2003, 316 (3-4) : 265 - 270
  • [18] On the metal-insulator transition in vanadium dioxide
    Fujita, Shigeji
    Jovaini, Azita
    Godoy, Salvador
    Suzuki, Akira
    PHYSICS LETTERS A, 2012, 376 (44) : 2808 - 2811
  • [19] Metal-insulator transition in the Hubbard model
    Bulla, R
    Pruschke, T
    Hewson, AC
    PHYSICA B-CONDENSED MATTER, 1999, 259-61 : 721 - 722
  • [20] Metal-insulator transition in amorphous alloys
    Möbius, A
    Adkins, CJ
    PHYSICA B, 2000, 284 : 1669 - 1670