INTERDIFFUSION STUDY IN THE Nb-Si BINARY SYSTEM

被引：0

作者：

Yang, Junying ^{[1
]}

Wei, Haixia ^{[1
]}

Zhou, Chungen ^{[1
]}

机构：

[1] Beihang Univ, Key Lab Aerosp Mat & Performance, Minist Educ, Sch Mat Sci & Engn, Beijing 100191, Peoples R China

来源：

INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2010年 / 24卷 / 15-16期

关键词：

Kinetics; interdiffusion; diffusion theory; silicide; INTERMETALLICS; DIFFUSION; SILICIDES; COATINGS;

D O I：

10.1142/S0217979210066264

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Diffusion experiments on Nb/Si couples were conducted at 1050 degrees C, 1150 degrees C, 1250 degrees C for annealing for 8h, 10h and 15h. Two intermediate phases, NbSi2 and Nb5Si3, were found to develop and grow as parallel layers in the Nb/Si couples, according to the parabolic rate law. The diffusion properties of the different phases were evaluated in terms of alternative theories, which were demonstrated to be equivalent algebraically but complementary because they are expressed in terms of different experimental variables.

引用

页码：3167 / 3172

页数：6

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