GaInNAs/GaAs quantum dots grown by chemical beam epitaxy

被引:49
|
作者
Makino, S [1 ]
Miyamoto, T [1 ]
Kageyama, T [1 ]
Nishiyama, N [1 ]
Koyama, F [1 ]
Iga, K [1 ]
机构
[1] Tokyo Inst Technol, Precis & Intelligence Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
基金
日本学术振兴会;
关键词
GaInNAs/GaAs; self-assembled quantum dot; VCSEL; chemical beam epitaxy;
D O I
10.1016/S0022-0248(00)00778-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
GaInNAs/GaAs quantum dot (QD) structure is expected to be one of the novel materials to extend the emission wavelength of GaAs-based lasers. In this work, we have grown GaInNAs QDs by chemical beam epitaxy (CBE) with nitrogen radicals for the first time. The effect of nitrogen (N) introduction to the QD formation was investigated. We found that the dot density and size were strongly influenced by the supplied N quantity for the N composition up to 1.5%. The maximum dot density of 1.2 x 10(11) cm(-2) was obtained at 1% of N composition. A photoluminescence (PL) from GaInNAs QDs was obtained at room temperature (RT) with a peak wavelength of 1.1 mum. The peak wavelength was slightly red-shifted in comparison with GaInAs QDs grown under the same condition except N introduction. This result is considered as the reduction of the band gap by the N introduction. The first lasing operation was also obtained from a GaInNAs QDs laser under pulsed condition at 77 K. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:561 / 565
页数:5
相关论文
共 50 条
  • [21] Chemical beam epitaxy of GaInNAs/GaAs quantum wells and its optical absorption property
    Miyamoto, T
    Takeuchi, K
    Kageyama, T
    Koyama, F
    Iga, K
    JOURNAL OF CRYSTAL GROWTH, 1999, 197 (1-2) : 67 - 72
  • [22] The effect of encapsulation on the morphology and chemical composition of InAs/GaAs quantum dots grown by molecular beam epitaxy
    Zhi, D
    Wei, M
    Dunin-Borkowski, RE
    Midgley, PA
    Pashley, DW
    Jones, TS
    Joyce, BA
    Fewster, PF
    Goodhew, PJ
    MICROELECTRONIC ENGINEERING, 2004, 73-4 : 604 - 609
  • [23] Formation of InAs quantum dots on GaAs(100) by chemical beam epitaxy
    Park, SJ
    Lee, HT
    Kim, JH
    Seong, TY
    Kim, SB
    Ro, JR
    Lee, EH
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1997, 31 (03) : 537 - 540
  • [24] Composition dependence of thermal annealing effect on 1.3 μm GaInNAs/GaAs quantum well lasers grown by chemical beam epitaxy
    Makino, S
    Miyamoto, T
    Kageyama, T
    Ikenaga, Y
    Arai, M
    Koyama, F
    Iga, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2001, 40 (11B): : L1211 - L1213
  • [25] Quantum dot-like behavior of GaInNAs in GaInNAs/GaAs quantum wells grown by gas-source molecular-beam epitaxy
    Xin, HP
    Kavanagh, KL
    Zhu, ZQ
    Tu, CW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (04): : 1649 - 1653
  • [26] GaInNAs/GaAs quantum wells grown by molecular-beam epitaxy emitting above 1.5 μm
    Tournié, E
    Pinault, MA
    Laügt, M
    Chauveau, JM
    Trampert, A
    Ploog, KH
    APPLIED PHYSICS LETTERS, 2003, 82 (12) : 1845 - 1847
  • [27] Photoluminescence quenching mechanisms in GaInNAs/GaAs quantum well grown by solid source molecular beam epitaxy
    Ng, TK
    Yoon, SF
    Fan, WJ
    Loke, WK
    Wang, SZ
    Ng, ST
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 2324 - 2328
  • [28] Quality improvement of GaInNAs/GaAs quantum wells grown by plasma-assisted molecular beam epitaxy
    Li, LH
    Pan, Z
    Zhang, W
    Lin, YW
    Wang, XY
    Wu, RH
    JOURNAL OF CRYSTAL GROWTH, 2001, 227 : 527 - 531
  • [29] Thermally induced diffusion in GaInNAs/GaAs and GaInAs/GaAs quantum wells grown by solid source molecular beam epitaxy
    Ng, TK
    Djie, HS
    Yoon, SF
    Mei, T
    JOURNAL OF APPLIED PHYSICS, 2005, 97 (01)
  • [30] Nitrogen composition and growth temperature dependence of growth characteristics for self-assembled GaInNAs/GaAs quantum dots by chemical beam epitaxy
    Makino, S
    Miyamoto, T
    Kageyama, T
    Ikenaga, Y
    Koyama, F
    Iga, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (2B): : 953 - 957