Pulsed Laser Deposition of Nanostructured Thin Films: A Review

被引:0
作者
Elgazzar, Haytham [1 ]
Elbashar, Y. H. [2 ]
机构
[1] Cent Met Res & Dev Inst, Laser & Addit Mfg Dept, Cairo, Egypt
[2] Cairo Univ, Egypt Nanotechnol Ctr EGNC, Giza, Egypt
来源
NONLINEAR OPTICS QUANTUM OPTICS-CONCEPTS IN MODERN OPTICS | 2022年 / 56卷 / 3-4期
关键词
Pulsed laser deposition; Silicon carbide; thin films; Silicon wafers; stoichiometric transfer; STAINLESS-STEEL; INTERNAL-FRICTION; YAG LASER; SHADOWGRAPHY; DESIGN; SYSTEM; OXIDE; IMPLEMENTATION; TUNGSTEN; MATRIX;
D O I
暂无
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The increasing demand for pulsed laser thin films deposition in the last two decades referred to its unique advantages such as stoichiometric transfer of complex material, multilayer growth and flexibility. This paper highlights the concept of the PLD process with emphasis on the PLD parameters taking into consideration the deposition of SiC thin films as an example of a most common application of this process.
引用
收藏
页码:235 / 244
页数:10
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