Effect of Nb-ion implantation on the oxidation resistance of TiAl

被引：27
|
作者：
Taniguchi, S
Shibata, T
Saeki, T
Zhang, HX
Liu, XH
机构：
[1] BEIJING NORMAL UNIV,INST LOW ENERGY NUCL PHYS,BEIJING 100875,PEOPLES R CHINA
[2] CHINESE ACAD SCI,SHANGHAI INST MET,ION BEAM LAB,SHANGHAI 200050,PEOPLES R CHINA
来源：
MATERIALS TRANSACTIONS JIM | 1996年 / 37卷 / 05期
关键词：
titanium aluminide; oxidation; temperature cycle; high temperature; niobium; implantation; alumina scale;
D O I：
10.2320/matertrans1989.37.998
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The TiAI specimens implanted with Mb ions of a dose of 1.2 x 10(21) m(-2) were subjected to isothermal and cyclic oxidation tests at 1200 K in a flow of purified oxygen under atmospheric pressure. The results were compared with those for Nb-free specimens. The implantation of Nb ions decreases the overall oxidation rate in the both tests. There is no scale spallation from the Nb-implanted specimen during the cyclic oxidation. Two kinds of scales were formed on each specimen: an alumina-rich (virtually alumina) scale and a two-layer scale which has been often observed. The implantation of Nb improves the mechanical integrity of the alumina scale and decreases the growth rate of the two-layer scale.
引用
收藏
页码：998 / 1003
页数：6
相关论文
共 50 条
  • [1] Effects of C, Nb and C+Nb combined ion implantation on the oxidation resistance of γ-TiAl based alloy
    Li, XY
    Taniguchi, S
    Zhu, YC
    Fujita, K
    Iwamoto, N
    Matsunaga, Y
    Nakagawa, K
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2001, 316 (1-2): : 224 - 230
  • [2] The effect of nitrogen ion implantation on the oxidation Behavior of TiAl
    Yoshihara, M
    Taniguchi, S
    Fujita, K
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 2004, 68 (07) : 468 - 474
  • [3] Influence of Nb ion implantation on oxidation behavior of γ-TiAl alloys in flowing air
    Zhu, YC
    Matsumoto, Y
    Fujita, K
    Iwamoto, N
    MATERIALS TRANSACTIONS JIM, 2000, 41 (05): : 574 - 576
  • [4] Improvement of oxidation-resistance of γ-TiAl alloy by high temperature Nb and Al ion implantation
    Li, XY
    Zhu, YC
    Fujita, K
    Iwamoto, N
    Matsunaga, Y
    Nakagawa, K
    Taniguchi, S
    MATERIALS TRANSACTIONS JIM, 2000, 41 (09): : 1157 - 1160
  • [5] Effect of ion implantation of high melting point elements on oxidation behavior of TiAl
    Yoshihara, M
    Taniguchi, S
    Zhu, YC
    HIGH TEMPERATURE CORROSION AND PROTECTION OF MATERIALS 5, PTS 1 AND 2, 2001, 369-3 : 395 - 402
  • [6] Oxidation resistance of TiAl improved by ion implantation of beta-former elements
    Taniguchi, S
    Yoshihara, M
    Fujita, K
    MATERIALS TRANSACTIONS, 2004, 45 (05) : 1693 - 1699
  • [7] Influence of ion implantation on oxidation behavior of TiAl
    Yoshihara, Michiko
    Taniguchi, Shigeji
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2006, 20 (25-27): : 4667 - 4672
  • [8] Oxidation behavior of TiAl protected by Si plus Nb combined ion implantation
    Li, XY
    Taniguchi, S
    Zhu, YC
    Fujita, K
    Iwamoto, N
    Matsunaga, Y
    Nakagawa, K
    INTERMETALLICS, 2001, 9 (05) : 443 - 449
  • [9] TEM observations of the initial oxidation stages of Nb-ion-implanted TiAl
    Taniguchi, S
    Zhu, YC
    Fujita, K
    Iwamoto, N
    OXIDATION OF METALS, 2002, 58 (3-4): : 375 - 390
  • [10] TEM Observations of the Initial Oxidation Stages of Nb-Ion-Implanted TiAl
    Shigeji Taniguchi
    Yao-Can Zhu
    Kazuhisa Fujita
    Nobuya Iwamoto
    Oxidation of Metals, 2002, 58 : 375 - 390
12345