A DFT study on the effect of surface termination in CdTe (111)/α-Al2O3 (0001) heteroepitaxy

被引:6
作者
Meinander, Kristoffer [1 ]
Preston, John S. [1 ]
机构
[1] McMaster Univ, Dept Engn Phys, Hamilton, ON L8S 4L7, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
Density functional theory; Heteroepitaxy; Sapphire; Cadmium telluride; ALPHA-ALUMINA; SAPPHIRE; EPITAXY; DEPOSITION; LEED;
D O I
10.1016/j.susc.2014.09.013
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The heteroepitaxial growth of thin films on complex oxide substrates is highly dependent on chemical interactions in the interfacial material layers. We use first-principle density functional theory calculations to investigate the effect of alterations in the substrate termination in CdTe heteroepitaxy on c-plane sapphire, i. e., alpha-Al2O3 (0001). Comparing to previous experimental results, we rationalize the observations that an artificial alteration of the surface termination, through the addition of aluminum on the substrate surface, will affect rotational domain alignment. Our findings show that Al adatoms will occupy sites on the sapphire surface that otherwise would be beneficial for the binding of CdTe dimers, effectively altering the orientation of dimers during the initial growth process. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:93 / 97
页数:5
相关论文
共 50 条
  • [41] Role of Surface Hydroxyl Groups on Zinc Adsorption Characteristics on α-Al2O3(0001) Surfaces: First-Principles Study
    Cavallotti, Remi
    Goniakowski, Jacek
    Lazzari, Remi
    Jupille, Jacques
    Koltsov, Alexey
    Loison, Didier
    JOURNAL OF PHYSICAL CHEMISTRY C, 2014, 118 (25) : 13578 - 13589
  • [42] Heteroepitaxial growth of Ga2O3 thin films on Al2O3(0001) by ion beam sputter deposition
    Kalanov, Dmitry
    Gerlach, Juergen W.
    Bundesmann, Carsten
    Bauer, Jens
    Lotnyk, Andriy
    von Wenckstern, Holger
    Anders, Andre
    Unutulmazsoy, Yeliz
    JOURNAL OF APPLIED PHYSICS, 2024, 136 (01)
  • [43] Morphological and structural investigation of the early stages of epitaxial growth of α-Fe2O3 (0001) on α-Al2O3 (0001) by oxygen-plasma-assisted MBE
    Yi, SI
    Liang, Y
    Thevuthasan, S
    Chambers, SA
    SURFACE SCIENCE, 1999, 443 (03) : 212 - 220
  • [44] Influence of the hydroxylation of γ-Al2O3 surfaces on the stability and growth of Cu for Cu/γ-Al2O3 catalyst: A DFT study
    Li, Jingrui
    Zhang, Riguang
    Wang, Baojun
    APPLIED SURFACE SCIENCE, 2013, 270 : 728 - 736
  • [45] Epitaxial growth and properties of cubic WN on MgO(001), MgO(111), and Al2O3(0001)
    Ozsdolay, B. D.
    Mulligan, C. P.
    Guerette, Michael
    Huang, Liping
    Gall, D.
    THIN SOLID FILMS, 2015, 590 : 276 - 283
  • [46] Domain Matching Epitaxial Growth of In2O3 Thin Films on α-Al2O3(0001)
    Zhang, K. H. L.
    Lazarov, V. K.
    Galindo, P. L.
    Oropeza, F. E.
    Payne, D. J.
    Lai, H. H. -C.
    Egdell, R. G.
    CRYSTAL GROWTH & DESIGN, 2012, 12 (02) : 1000 - 1007
  • [47] Stability and formation of hydroxylated α-Al2O3(0001) surfaces at high temperatures
    Chen, Jiachen
    Sharapa, Dmitry
    Plessow, Philipp N.
    PHYSICAL REVIEW RESEARCH, 2022, 4 (01):
  • [48] Dual-layer structure of Ti on Al2O3(0001) grown epitaxially at room temperature
    Chen, WC
    Lin, YR
    Guo, XJ
    Wu, ST
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2003, 42 (4A): : L381 - L383
  • [49] Growth and characterization of epitaxial Zr(0001) thin films on Al2O3(0001)
    Fankhauser, Joshua
    Sato, Masaki
    Yu, Dian
    Ebnonnasir, Abbas
    Kobashi, Makoto
    Goorsky, Mark S.
    Kodambaka, Suneel
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (05):
  • [50] Long-Range Atomic Order on Double-Stepped Al2O3(0001) Surfaces
    Smink, Sander
    Majer, Lena N.
    Boschker, Hans
    Mannhart, Jochen
    Braun, Wolfgang
    ADVANCED MATERIALS, 2024, 36 (24)