Evaluation of capacitance-voltage characteristics for high voltage SiC-JFET

被引:15
|
作者
Funaki, Tsuyoshi [1 ]
Kimoto, Tsunenobu
Hikihara, Takashi
机构
[1] Kyoto Univ, Dept Elect Engn, Kyoto, Japan
[2] Kyoto Univ, Grad Sch Engn, Dept Elect Engn & Sci, Kyoto 615, Japan
来源
IEICE ELECTRONICS EXPRESS | 2007年 / 4卷 / 16期
关键词
C-V characteristics; high voltage; SiC; JFET; device structure;
D O I
10.1587/elex.4.517
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Capacitance between terminals of a power semiconductor device substantially affects on its switching operation. This paper presents a capacitance - voltage ( C - V) characterization system for measuring high voltage SiC - JFET and the results. The C - V characterization system enables one to impose high drain- source voltage to the device and extracts the capacitance between two of three terminals in FET by eliminating its influence on the neighboring terminal. The capacitance between the gate and drain, and the drain and source represents the hybrid structure of the lateral channel and vertical drift layer of the SiC - JFET.
引用
收藏
页码:517 / 523
页数:7
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