Silicon-dioxide waveguides with low birefringence

被引:26
|
作者
de Peralta, LG [1 ]
Bernussi, AA
Temkin, H
Borhani, MM
Doucette, DE
机构
[1] Texas Tech Univ, Nano Tech Ctr, Lubbock, TX 79409 USA
[2] X Fab Texas, Lubbock, TX 79415 USA
关键词
glass; multiplexing; optical waveguides; photoelasticity; polarization;
D O I
10.1109/JQE.2003.813194
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We describe the use of highly boron-doped silicon dioxide for the preparation of optical waveguides with very low birefringence. Plasma-enhanced chemical vapor deposition was used to vary the boron content from 5 wt% to 10 wt%, at a constant phosphorus content of 4.8%. A transition from compressive to tensile stress was observed at a boron concentration of 9.1%. Pedestal-type waveguides formed with the high-boron top cladding layer show low loss of 0.02 dB/cm. Arrayed waveguide grating devices with a polarization-dependent wavelength shift of 0.01 nm and excellent stability have been demonstrated.
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页码:874 / 879
页数:6
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