X-ray absorption near edge structure and extended X-ray absorption fine structure studies of P doped (111) diamond

被引:7
作者
Shikata, Shinichi [1 ]
Yamaguchi, Koji [1 ,7 ]
Fujiwara, Akihiko [1 ]
Tamenori, Yusuke [2 ]
Tsuruta, Kazuki [2 ]
Yamada, Takatoshi [3 ]
Nicley, Shannon S. [4 ,5 ,8 ]
Haenen, Ken [4 ,5 ]
Koizumi, Satoshi [6 ]
机构
[1] Kwansei Gakuin Univ KGU, Sch Sci & Technol, Nishinomiya, Hyogo, Japan
[2] Japan Synchrotron Radiat Res Inst, Sayo, Hyogo, Japan
[3] Natl Inst Adv Ind Sci & Technol, Ibaraki, Japan
[4] Hasselt Univ, Inst Mat Res IMO, Diepenbeek, Belgium
[5] IMEC VZW, IMOMEC, Diepenbeek, Belgium
[6] Natl Inst Mat Sci NIMS, Ibaraki, Japan
[7] Murata Mfg Co Ltd, Kyoto, Japan
[8] Univ Oxford, Dept Mat, Oxford, England
关键词
n type doping; P doping; Power device; XAFS; HOMOEPITAXIAL DIAMOND; THIN-FILMS; PHOSPHORUS; SPECTROSCOPY; COMPENSATION;
D O I
10.1016/j.diamond.2020.107769
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The P dopant site control in diamond is critical to achieve high mobility n type channels and high concentration n+ layers for power device applications. In this study, the P doped diamond films grown by three institutes with varying hydrogen and dopant concentrations were analyzed by X-ray absorption near edge structure (XANES) and extended X-ray absorption fine structure (EXAFS). By XANES, the film with high H concentration (4.0 x 10(19) cm(-3)) was estimated to show a higher peak intensity of 2147.7 eV than that of a low H concentration film. H was likely to be incorporated in the diamond as P-H at the substitutional sites under H rich growth condition. Another film showed considerably low peak intensities at 2147.7 and 2148.6 eV because of the "substitutional with H" and "substitutional" sites, respectively. The EXAFS result revealed that the first nearest neighbor distance is slightly shifted from the "substitutional" to "interstitial" site. The low P concentration film showed different types of energy profiles, particularly in the high energy region, indicating that dopant sites change with dopant concentration. Overall, the P dopant site is likely to be influenced by the machine system, H and P concentrations.
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页数:6
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