Dynamic reaction cell ICPMS for trace metal analysis of semiconductor materials

被引：11

作者：

Kawabata, K

Kishi, Y

Thomas, R

机构：

来源：

ANALYTICAL CHEMISTRY | 2003年 / 75卷 / 19期

关键词：

D O I：

10.1021/ac0313926

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The need for lower detection levels in the semiconductor industry poses one of the greatest challenges to ICPMS.

引用

收藏

页码：422A / 428A

页数：7

相关论文

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