Magnetic annealing of plated high saturation magnetization soft magnetic FeCo alloy films

被引：12

作者：

Sun, NX ^{[1
]}

Mehdizadeh, S ^{[1
]}

Bonhote, C ^{[1
]}

Xiao, QF ^{[1
]}

York, B ^{[1
]}

机构：

[1] Hitachi Global Storage Technol, San Jose, CA 95193 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2005年 / 97卷 / 10期

关键词：

D O I：

10.1063/1.1855458

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plated high saturation magnetization soft magnetic FeCo films were annealed in magnetic field; their stress, microstructure, and magnetic properties were investigated. The FeCo films consistently showed a reduced tensile stress after magnetic annealing at temperatures above 255 degrees C. The annealing temperature was found to be the primary factor in reducing the tensile stress, while annealing time was secondary. The FeCo films showed improved soft magnetic properties when subjected to an easy axis annealing with reduced coercivities along both the easy axis and hard axis. Hard axis annealing on these FeCo films caused a switched easy and hard axis in these films when the annealing temperature is above 255 degrees C. (c) 2005 American Institute of Physics.

引用

页数：3

共 8 条

[1] TORQUE MEASUREMENTS OF INDUCED ANISOTROPY IN AMORPHOUS FE80-XB20+X ALLOYS [J].