Oxide-Based Electric-Double-Layer Thin-Film Transistors on a Flexible Substrate

被引:30
作者
Cai, Wensi [1 ]
Zhang, Jiawei [1 ]
Wilson, Joshua [1 ]
Ma, Xiaochen [1 ]
Wang, Hanbin [2 ]
Zhang, Xijian [2 ]
Xin, Qian [2 ]
Song, Aimin [1 ]
机构
[1] Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, England
[2] Shandong Univ, Sch Microelect, Ctr Nanoelect, Jinan 250100, Shandong, Peoples R China
基金
英国工程与自然科学研究理事会; 中国国家自然科学基金;
关键词
Electric-double-layer (EDL); flexible thinfilm transistors (TFTs); radio-frequency magnetron sputtered SiO2; InGaZnO; FIELD-EFFECT TRANSISTORS; LOW-VOLTAGE; HIGH-PERFORMANCE; HIGH-K; TRANSPARENT; NANOCOMPOSITE; ILLUMINATION; ELECTROLYTE; DIELECTRICS; GLASS;
D O I
10.1109/LED.2017.2768822
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Flexible electric-double-layer (EDL) InGaZnO thin-film transistors (TFTs) were fabricated on a plastic substrate at room temperature. A large EDL gate capacitance, 0.22 mu F/cm(2), at 20 Hz was achieved using 200-nm-thick radio frequency magnetron sputtered porous SiO2 as the dielectric layer, which is equivalent to similar to 15.7-nm thermally grown SiO2. The devices, therefore, show a low operating voltage of 1 V, a high current ON-OFF ratio > 10(5), and a low subthreshold swing < 0.12 V/decade. These properties were maintained even after bending, suggesting that the TFTs are suitable for applications in portable sensors and rollable displays.
引用
收藏
页码:1680 / 1683
页数:4
相关论文
共 39 条
[21]   Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors [J].
Nomura, K ;
Ohta, H ;
Takagi, A ;
Kamiya, T ;
Hirano, M ;
Hosono, H .
NATURE, 2004, 432 (7016) :488-492
[22]   Amorphous oxide semiconductors for high-performance flexible thin-film transistors [J].
Nomura, Kenji ;
Takagi, Akihiro ;
Kamiya, Toshio ;
Ohta, Hiromichi ;
Hirano, Masahiro ;
Hosono, Hideo .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (5B) :4303-4308
[23]   Interface and bulk effects for bias-light-illumination instability in amorphous-In-Ga-Zn-O thin-film transistors [J].
Nomura, Kenji ;
Kamiya, Toshio ;
Hosono, Hideo .
JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2010, 18 (10) :789-795
[24]   High-mobility, low-power, and fast-switching organic field-effect transistors with ionic liquids [J].
Ono, S. ;
Seki, S. ;
Hirahara, R. ;
Tominari, Y. ;
Takeya, J. .
APPLIED PHYSICS LETTERS, 2008, 92 (10)
[25]   Highly Flexible MoS2 Thin-Film Transistors with Ion Gel Dielectrics [J].
Pu, Jiang ;
Yomogida, Yohei ;
Liu, Keng-Ku ;
Li, Lain-Jong ;
Iwasa, Yoshihiro ;
Takenobu, Taishi .
NANO LETTERS, 2012, 12 (08) :4013-4017
[26]   Anomalous Threshold Voltage Shift and Surface Passivation of Transparent Indium-Zinc-Oxide Electric-Double-Layer TFTs [J].
Sun, Jia ;
Jiang, Jie ;
Dou, Wei ;
Zhou, Bin ;
Wan, Qing .
IEEE ELECTRON DEVICE LETTERS, 2011, 32 (07) :910-912
[27]   Low-Voltage Transparent Indium-Zinc-Oxide Coplanar Homojunction TFTs Self-Assembled on Inorganic Proton Conductors [J].
Sun, Jia ;
Jiang, Jie ;
Lu, Aixia ;
Zhou, Bin ;
Wan, Qing .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (03) :764-768
[28]   One-Volt Oxide Thin-Film Transistors on Paper Substrates Gated by SiO2-Based Solid Electrolyte With Controllable Operation Modes [J].
Sun, Jia ;
Jiang, Jie ;
Lu, Aixia ;
Wan, Qing .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (09) :2258-2263
[29]   Low-voltage electric-double-layer paper transistors gated by microporous SiO2 processed at room temperature [J].
Sun, Jia ;
Wan, Qing ;
Lu, Aixia ;
Jiang, Jie .
APPLIED PHYSICS LETTERS, 2009, 95 (22)
[30]   ZnO-Based Thin Film Transistor Fabricated Using Radio Frequency Magnetron Sputtering at Low Temperature [J].
Surabi, M. Amutha ;
Chandradass, J. ;
Park, Seong-Ju .
MATERIALS AND MANUFACTURING PROCESSES, 2015, 30 (02) :175-178