Oxide-Based Electric-Double-Layer Thin-Film Transistors on a Flexible Substrate

被引:28
作者
Cai, Wensi [1 ]
Zhang, Jiawei [1 ]
Wilson, Joshua [1 ]
Ma, Xiaochen [1 ]
Wang, Hanbin [2 ]
Zhang, Xijian [2 ]
Xin, Qian [2 ]
Song, Aimin [1 ]
机构
[1] Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, England
[2] Shandong Univ, Sch Microelect, Ctr Nanoelect, Jinan 250100, Shandong, Peoples R China
基金
英国工程与自然科学研究理事会; 中国国家自然科学基金;
关键词
Electric-double-layer (EDL); flexible thinfilm transistors (TFTs); radio-frequency magnetron sputtered SiO2; InGaZnO; FIELD-EFFECT TRANSISTORS; LOW-VOLTAGE; HIGH-PERFORMANCE; HIGH-K; TRANSPARENT; NANOCOMPOSITE; ILLUMINATION; ELECTROLYTE; DIELECTRICS; GLASS;
D O I
10.1109/LED.2017.2768822
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Flexible electric-double-layer (EDL) InGaZnO thin-film transistors (TFTs) were fabricated on a plastic substrate at room temperature. A large EDL gate capacitance, 0.22 mu F/cm(2), at 20 Hz was achieved using 200-nm-thick radio frequency magnetron sputtered porous SiO2 as the dielectric layer, which is equivalent to similar to 15.7-nm thermally grown SiO2. The devices, therefore, show a low operating voltage of 1 V, a high current ON-OFF ratio > 10(5), and a low subthreshold swing < 0.12 V/decade. These properties were maintained even after bending, suggesting that the TFTs are suitable for applications in portable sensors and rollable displays.
引用
收藏
页码:1680 / 1683
页数:4
相关论文
共 39 条
  • [21] Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
    Nomura, K
    Ohta, H
    Takagi, A
    Kamiya, T
    Hirano, M
    Hosono, H
    [J]. NATURE, 2004, 432 (7016) : 488 - 492
  • [22] Amorphous oxide semiconductors for high-performance flexible thin-film transistors
    Nomura, Kenji
    Takagi, Akihiro
    Kamiya, Toshio
    Ohta, Hiromichi
    Hirano, Masahiro
    Hosono, Hideo
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (5B): : 4303 - 4308
  • [23] Interface and bulk effects for bias-light-illumination instability in amorphous-In-Ga-Zn-O thin-film transistors
    Nomura, Kenji
    Kamiya, Toshio
    Hosono, Hideo
    [J]. JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2010, 18 (10) : 789 - 795
  • [24] High-mobility, low-power, and fast-switching organic field-effect transistors with ionic liquids
    Ono, S.
    Seki, S.
    Hirahara, R.
    Tominari, Y.
    Takeya, J.
    [J]. APPLIED PHYSICS LETTERS, 2008, 92 (10)
  • [25] Highly Flexible MoS2 Thin-Film Transistors with Ion Gel Dielectrics
    Pu, Jiang
    Yomogida, Yohei
    Liu, Keng-Ku
    Li, Lain-Jong
    Iwasa, Yoshihiro
    Takenobu, Taishi
    [J]. NANO LETTERS, 2012, 12 (08) : 4013 - 4017
  • [26] Anomalous Threshold Voltage Shift and Surface Passivation of Transparent Indium-Zinc-Oxide Electric-Double-Layer TFTs
    Sun, Jia
    Jiang, Jie
    Dou, Wei
    Zhou, Bin
    Wan, Qing
    [J]. IEEE ELECTRON DEVICE LETTERS, 2011, 32 (07) : 910 - 912
  • [27] Low-Voltage Transparent Indium-Zinc-Oxide Coplanar Homojunction TFTs Self-Assembled on Inorganic Proton Conductors
    Sun, Jia
    Jiang, Jie
    Lu, Aixia
    Zhou, Bin
    Wan, Qing
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (03) : 764 - 768
  • [28] One-Volt Oxide Thin-Film Transistors on Paper Substrates Gated by SiO2-Based Solid Electrolyte With Controllable Operation Modes
    Sun, Jia
    Jiang, Jie
    Lu, Aixia
    Wan, Qing
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (09) : 2258 - 2263
  • [29] Low-voltage electric-double-layer paper transistors gated by microporous SiO2 processed at room temperature
    Sun, Jia
    Wan, Qing
    Lu, Aixia
    Jiang, Jie
    [J]. APPLIED PHYSICS LETTERS, 2009, 95 (22)
  • [30] ZnO-Based Thin Film Transistor Fabricated Using Radio Frequency Magnetron Sputtering at Low Temperature
    Surabi, M. Amutha
    Chandradass, J.
    Park, Seong-Ju
    [J]. MATERIALS AND MANUFACTURING PROCESSES, 2015, 30 (02) : 175 - 178