Oxide-Based Electric-Double-Layer Thin-Film Transistors on a Flexible Substrate

被引:28
作者
Cai, Wensi [1 ]
Zhang, Jiawei [1 ]
Wilson, Joshua [1 ]
Ma, Xiaochen [1 ]
Wang, Hanbin [2 ]
Zhang, Xijian [2 ]
Xin, Qian [2 ]
Song, Aimin [1 ]
机构
[1] Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, England
[2] Shandong Univ, Sch Microelect, Ctr Nanoelect, Jinan 250100, Shandong, Peoples R China
基金
英国工程与自然科学研究理事会; 中国国家自然科学基金;
关键词
Electric-double-layer (EDL); flexible thinfilm transistors (TFTs); radio-frequency magnetron sputtered SiO2; InGaZnO; FIELD-EFFECT TRANSISTORS; LOW-VOLTAGE; HIGH-PERFORMANCE; HIGH-K; TRANSPARENT; NANOCOMPOSITE; ILLUMINATION; ELECTROLYTE; DIELECTRICS; GLASS;
D O I
10.1109/LED.2017.2768822
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Flexible electric-double-layer (EDL) InGaZnO thin-film transistors (TFTs) were fabricated on a plastic substrate at room temperature. A large EDL gate capacitance, 0.22 mu F/cm(2), at 20 Hz was achieved using 200-nm-thick radio frequency magnetron sputtered porous SiO2 as the dielectric layer, which is equivalent to similar to 15.7-nm thermally grown SiO2. The devices, therefore, show a low operating voltage of 1 V, a high current ON-OFF ratio > 10(5), and a low subthreshold swing < 0.12 V/decade. These properties were maintained even after bending, suggesting that the TFTs are suitable for applications in portable sensors and rollable displays.
引用
收藏
页码:1680 / 1683
页数:4
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