Measurements and diagnostics of diamond films and coatings

被引:9
作者
Miyoshi, K [1 ]
Wu, RLC
机构
[1] NASA, Glenn Res Ctr, Cleveland, OH 44135 USA
[2] K Syst Corp, Beavercreek, OH 45432 USA
关键词
measurement; diagnostic methodology; chemical-vapor-deposited (CVD) diamond; films and coatings;
D O I
10.1016/S0263-2241(00)00032-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The commercial potential of chemical-vapor-deposited (CVD) diamond films has been established and a number of applications have been identified through university, industry, and government research studies. This paper discusses the methodologies used for property measurement and diagnostic of CVD diamond films and coatings. Measurement and diagnostic techniques studied include scanning electron microscopy, transmission electron microscopy, atomic force microscopy, stylus profilometry, X-ray diffraction, electron diffraction, Raman spectroscopy, Rutherford backscattering, elastic recoil spectroscopy, and friction examination. Each measurement and diagnostic technique provides unique information. A combination of techniques can provide the technical information required to understand the quality and properties of CVD diamond films, which are important to their application in specific component systems and environments. In this study the combination of measurement and diagnostic techniques was successfully applied to correlate deposition parameters and resultant diamond film composition, crystallinity, grain size, surface roughness, and coefficient of friction. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
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页码:113 / 126
页数:14
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