Application of ultrashort lasers pulses in micro- and nano-technologies

被引：0
作者：
Zamfirescu, M. [1 ]
Ulmeanu, M. [1 ]
Jipa, F. [1 ]
Catalina, R. [1 ]
Anghel, I. [1 ]
Dabu, R. [1 ]
机构：
[1] Natl Inst Laser Plasma & Radiat Phys INFLPR Bucha, Magurele 077125, Romania
来源：
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS | 2010年 / 12卷 / 11期
关键词：
Ultrashort laser pulses; Laser micro-structuring; Laser direct-writing; Two -photon photopolymerization; Near-field laser lithography; FEMTOSECOND LASER; FABRICATION; ABLATION;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Laser induced modification of materials is used for produce micro and nanostructures. Different techniques such as laser ablation, two-photon photopolymerization (TPP), near-field laser lithography (NFLL) are developed for structuring of various shapes and geometries using laser beams with 180 fs pulse duration at 775 nm, or 400 ps pulse duration at 532 nm. The realized structures and their applications are presented.
引用
收藏
页码：2179 / 2184
页数：6
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