Broadband characterization of multilayer dielectric thin-films

被引:0
作者
Orloff, Nathan [1 ,2 ,3 ]
Mateu, Jordi [1 ,4 ]
Murakami, Makoto [5 ]
Takeuchi, Ichiro [2 ,3 ,5 ]
Booth, James C. [1 ]
机构
[1] Natl Inst Stand & Technol, Boulder, CO 80302 USA
[2] Univ Maryland, Dept Phys, College Pk, MD 20742 USA
[3] Univ Maryland, Ctr Superconduct Res, College Pk, MD 20742 USA
[4] Polytech Univ, Barcelona, Spain
[5] Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USA
来源
2007 IEEE/MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-6 | 2007年
关键词
broadband; multiferroic; PbTiO3; thin-films;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We developed a measurement technique for obtaining the broadband complex permittivity of thin-film dielectric materials over the frequency range from 100 Hz - 40 GHz. Such broad frequency coverage can only be accomplished by combining lumped-element and distributed devices, and is implemented in this technique using planar capacitors and transmission lines. We experimentally determined the capacitance and conductance per unit length for these different structures fabricated on the same thin-film samples, and, through the use of detailed finite-element simulations, extract consistent values for the relative permittivity. We demonstrate the utility of this technique by applying it to study the frequency dependence of the dielectric response of ferroelectric, ferromagnetic, and multi-ferroic thin-film samples.
引用
收藏
页码:1174 / +
页数:2
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