50-nm T-gate metamorphic GaAs HEMTs with fT of 440 GHz and noise figure of 0.7 dB at 26 GHz

被引:41
作者
Elgaid, K [1 ]
McLelland, H [1 ]
Holland, M [1 ]
Moran, DAJ [1 ]
Stanley, CR [1 ]
Thayne, IG [1 ]
机构
[1] Univ Glasgow, Nanoelectr Res Ctr, Dept Elect & Elect Engn, Glasgow G12 8LT, Lanark, Scotland
基金
英国工程与自然科学研究理事会;
关键词
high-electron mobility transistor (HEMT); low noise; metamorphic; metamorphic high-electron mobility transistor (mHEMT); millimeter-wave imaging; nanometer gates; short gate;
D O I
10.1109/LED.2005.857716
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
GaAs-based transistors with the highest f(T) and lowest noise figure reported to date are presented in this letter. A 50-nm T-gate In0.52Al0.48As/In0.53Ga0.47As Metamorphic high-electron mobility transistors (mHEMTs) on a GaAs substrate show f(T) of 440 GHz, f(max) of 400 GHz, a minimum noise figure of 0.7 dB and an associated gain of 13 dB at 26 GHz, the latter at a drain current of 185 mA/mm and g(m) of 950 mS/mm. In addition, a noise figure of below 1.2 dB with 10.5 dB or higher associated gain at 26 GHz was demonstrated for drain currents in the range 40 to 470 mA/mm at a drain bias of 0.8 V. These devices are ideal for low noise and medium power applications at millimeter-wave frequencies.
引用
收藏
页码:784 / 786
页数:3
相关论文
共 11 条
[1]  
CHEN Y, 2003, 47 INT C EL ION PHOT
[2]  
Duh K. H. G., 1991, IEEE Microwave and Guided Wave Letters, V1, P114, DOI 10.1109/75.89081
[3]  
LAI R, 1999, INT C GALL ARS MAN T
[4]  
Leuther A, 2005, CONF P INDIUM PHOSPH, P129
[5]  
Leuther A, 2003, CONF P INDIUM PHOSPH, P215
[6]   Low-noise metamorphic HEMTs with reflowed 0.1 μm T-gate [J].
Lien, YC ;
Chang, EY ;
Chang, HC ;
Chu, LH ;
Huang, GW ;
Lee, HM ;
Lee, CS ;
Chen, SH ;
Shen, PT ;
Chang, CY .
IEEE ELECTRON DEVICE LETTERS, 2004, 25 (06) :348-350
[7]  
MORAN DAJ, 2004, P 12 GALL ARS OTH CO, P311
[8]   Ultrahigh-speed pseudomorphic InGaAs/InAlAs HEMTs with 400-GHz cutoff frequency [J].
Shinohara, K ;
Yamashita, Y ;
Endoh, A ;
Hikosaka, K ;
Matsui, T ;
Mimura, T ;
Hiyamizu, S .
IEEE ELECTRON DEVICE LETTERS, 2001, 22 (11) :507-509
[9]   Low noise In0.32(AlGa)0.68As/In0.43Ga0.57As metamorphic HEMT on GaAs substrate with 850 mW/mm output power density [J].
Whelan, CS ;
Hoke, WE ;
McTaggart, RA ;
Lardizabal, SM ;
Lyman, PS ;
Marsh, PF ;
Kazior, TE .
IEEE ELECTRON DEVICE LETTERS, 2000, 21 (01) :5-8
[10]   Pseudomorphic In0.52Al0.48As/In0.7Ga0.3As HEMTs with an ultrahigh fT of 562 GHz [J].
Yamashita, Y ;
Endoh, A ;
Shinohara, K ;
Hikosaka, K ;
Matsui, T ;
Hiyamizu, S ;
Mimura, T .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (10) :573-575